High-power impulse magnetron sputtering is a deposition technique where a metal
magnetron target is sputtered in a high-density plasma to synthesise thin layers with …

The objective of this paper is to study the effect of magnetic field strength on spoke
behaviour in a high power impulse magnetron sputtering discharge. In three magnetic field …

The marked difference in behaviour between HiPIMS and conventional dc or pulsed-dc
magnetron sputtering discharges with changing magnetic field strengths is demonstrated …

Using a triple probe situated above the racetrack and inside the magnetic trap of a
magnetron, rotating spoke-like structures have been clearly identified in a single HiPIMS …

High power impulse magnetron sputtering (HiPIMS) discharges are an excellent tool for
deposition of thin films with superior properties. By adjusting the plasma parameters, an …

The localized target current density associated with quasi-periodic ionization zones (spokes)
has been measured in a high power impulse magnetron sputtering (HiPIMS) discharge …

The sideways (radial) deposition rate and ionized flux fraction in a high power impulse
magnetron sputtering (HiPIMS) discharge are studied and compared to a dc magnetron …

The self-organised plasma patterns, known as spokes or ionisation zones in magnetron
sputtering discharges, were observed in a wide range of power densities, from low power …

High power magnetron sputtering (HiPIMS) discharges generate ions with high kinetic
energies in comparison to conventional dc magnetron sputtering. The peculiar shape of the …

The velocity distribution function of titanium neutrals in the target region of a high power
impulse magnetron sputtering discharge was investigated by optical emission spectroscopy …