[HTML][HTML] Multiple patterning bi-line/tri-line structure at limiting resolution for 7 nm by negative tone development of ArF immersion lithography
J Zhu, L Yue, Q Wu, Y Li - Alexandria Engineering Journal, 2024 - Elsevier
Abstract Since the advanced Integrated Circuit (IC) manufacturing process has reached the
14 nm technology node and beyond, the pattern size of integrated circuits has become much …
14 nm technology node and beyond, the pattern size of integrated circuits has become much …