Conspectus Hot wire chemical vapor deposition (HWCVD), also referred to as catalytic CVD
(Cat-CVD), has been used to produce Si-containing thin films, nanomaterials, and functional …

Thermal decomposition of tetraethylsilane was investigated at temperatures up to 1330 K
using flash pyrolysis vacuum ultraviolet photoionization mass spectrometry. Density …

The kinetics and thermochemistry of the decomposition pathways for 1, 3-disilacyclobutane
(1, 3-DSCB) in the gas phase were studied using the second-order Møller–Plesset (MP2) …

The gas-phase reaction chemistry of using 1-methylsilacyclobutane (MSCB) in the hot-wire
chemical vapor deposition (CVD) process has been investigated by studying the …

The formation of methyl radical from the decomposition of four methyl-substituted silane
molecules, including monomethylsilane (MMS), dimethylsilane (DMS), trimethylsilane …

The effect of the Si–H bond on the gas-phase reaction chemistry of trimethylsilane in the hot-
wire chemical vapor deposition (HWCVD) process has been studied by examining its …

A method of forming crystalline tungsten carbides was reported by exposing the heated
tungsten filament to 1, 1, 3, 3-tetramethyl-1, 3-disilacyclobutane (TMDSCB) in a hot-wire …

The alloying of tungsten filament when using 1, 1, 3, 3-tetramethyl-1, 3-disilacyclobutane
(TMDSCB) in a hot-wire chemical vapor deposition reactor was systematically studied by …

The primary decomposition of 1, 3-disilacyclobutane (DSCB) on a tungsten filament and its
secondary gas-phase reactions in a hot-wire chemical vapor deposition (CVD) reactor have …

Production of O atoms, H (D) atoms, and OH (OD) radicals was confirmed in the catalytic
decomposition of H2O (D2O) on a heated Ir filament by laser spectroscopic techniques, such …