Recent advances in GaN‐based power HEMT devices

J He, WC Cheng, Q Wang, K Cheng… - Advanced electronic …, 2021 - Wiley Online Library
The ever‐increasing power density and operation frequency in electrical power conversion
systems require the development of power devices that can outperform conventional Si …

Challenges and opportunities for high-power and high-frequency AlGaN/GaN high-electron-mobility transistor (HEMT) applications: A review

M Haziq, S Falina, AA Manaf, H Kawarada, M Syamsul - Micromachines, 2022 - mdpi.com
The emergence of gallium nitride high-electron-mobility transistor (GaN HEMT) devices has
the potential to deliver high power and high frequency with performances surpassing …

Normally-OFF AlGaN/GaN MIS-HEMTs With Low RON and Vth Hysteresis by Functioning In-situ SiNx in Regrowth Process

J He, Q Wang, G Zhou, W Li, Y Jiang… - IEEE Electron …, 2022 - ieeexplore.ieee.org
Normally-off AlGaN/GaN MIS-HEMTs with a high threshold voltage () more than 2.5 V and a
low on-resistance of mm have been achieved by an improved regrowth technique with in …

[HTML][HTML] Improvement of DC Performance and RF Characteristics in GaN-Based HEMTs Using SiNx Stress-Engineering Technique

C Deng, P Wang, C Tang, Q Hu, F Du, Y Jiang… - Nanomaterials, 2024 - mdpi.com
In this work, the DC performance and RF characteristics of GaN-based high-electron-
mobility transistors (HEMTs) using the SiNx stress-engineered technique were …

Current collapse suppression in AlGaN/GaN HEMTs using dual-layer SiNx stressor passivation

C Deng, WC Cheng, XG Chen, KY Wen, MH He… - Applied Physics …, 2023 - pubs.aip.org
In this work, a dramatic reduction in current collapse is achieved in GaN-based high-electron-
mobility transistors (HEMTs) using dual-layer SiN x stressor passivation (DSSP), and the …

Modeling of forward gate leakage current for normally off pGaN/AlGaN/GaN HEMTs

A Sarkar, YM Haddara - Solid-State Electronics, 2022 - Elsevier
We have developed a generalized numerical model for gate leakage current (IG) in normally
off pGaN/AlGaN/GaN high electron mobility transistors. Across all devices, leakage primarily …

A robust Ni/Au process and mechanism for p-type ohmic contact applied to GaN p-FETs

C Tang, C Fu, F Du, C Deng, Y Jiang, K Wen… - Journal of Alloys and …, 2024 - Elsevier
In this study, a new robust ohmic contact preparation process for GaN p-FETs application is
developed on p-GaN/AlGaN/GaN, which excluded the commonly used descum step. A …

[HTML][HTML] Suppression of Short-Channel Effects in AlGaN/GaN HEMTs Using SiNx Stress-Engineered Technique

C Deng, C Tang, P Wang, WC Cheng, F Du, K Wen… - Nanomaterials, 2024 - mdpi.com
In this work, we present the novel application of SiNx stress-engineering techniques for the
suppression of short-channel effects in AlGaN/GaN high-electron-mobility transistors …

On The Role of Stress Engineering of Surface Passivation in Determining the Device Performance of AlGaN/GaN HEMTs

MA Mir, A Thakare, MA Munshi… - 2024 IEEE …, 2024 - ieeexplore.ieee.org
In this work, we report an improvement in the device's threshold voltage, off-state voltage
handling capability, and dynamic ON resistance behavior with stress engineering in the …