YL Hsieh, LH Kau, HJ Huang, CC Lee, YK Fuh, TT Li - Coatings, 2018 - mdpi.com
We report plasma-enhanced chemical vapor deposition (PECVD) hydrogenated nano- crystalline silicon (nc-Si: H) thin films. In particular, the effect of hydrogen dilution ratio (R …
Hydrogenated nanocrystalline silicon (nc-Si: H) thin films deposited on c-Si and quartz substrates by layer-by-layer (LBL) technique using radio-frequency plasma enhanced …
The silicon thin films have been deposited using VHF (60 MHz) plasma enhanced chemical vapor deposition (PECVD) process. The influence of the power (10–50 W), used during the …
We have studied the origin of photoluminescence (PL) from hydrogenated nanocrystalline silicon (nc-Si: H) films produced by a plasma-enhanced chemical vapor deposition …
SB Amor, R Bousbih, R Ouertani, W Dimassi… - Solar energy, 2014 - Elsevier
In order to characterize the surface of nanocrystalline hydrogenated silicon (nc-Si: H) and to get more insight into the film's growth deposited by plasma enhanced chemical vapor …
Chromium metal‐induced nanocrystallization of amorphous silicon (a‐Si) thin films is reported. The nanocrystalline nature of these films is confirmed from X‐ray diffraction and …
The aim of this study is to synthesis large area, plastic compatible of p-type nanocrystalline silicon through conventional sputter system. The growth of and p-type doping of …
S El Whibi, L Derbali, P Tristant, C Jaoul… - Journal of Materials …, 2019 - Springer
In this work we investigated a novel approach to elaborate hydrogenated nanocrystalline silicon (nc-Si: H) thin films using microwave plasma enhanced chemical vapor deposition …
Hydrogenated nanocrystalline silicon (nc-Si: H) thin films deposited by radio-frequency plasma enhanced chemical vapour deposition was irradiated by an energetic ion beam …