Optical properties and crystallinity of hydrogenated nanocrystalline silicon (nc-Si: H) thin films deposited by rf-PECVD

GB Tong, Z Aspanut, MR Muhamad, SA Rahman - Vacuum, 2012 - Elsevier
Hydrogenated nanocrystalline silicon (nc-Si: H) thin films prepared in a home-built radio-
frequency (rf) plasma enhanced chemical vapour deposition (PECVD) system have been …

In situ plasma monitoring of PECVD nc-Si: H films and the influence of dilution ratio on structural evolution

YL Hsieh, LH Kau, HJ Huang, CC Lee, YK Fuh, TT Li - Coatings, 2018 - mdpi.com
We report plasma-enhanced chemical vapor deposition (PECVD) hydrogenated nano-
crystalline silicon (nc-Si: H) thin films. In particular, the effect of hydrogen dilution ratio (R …

Structural and optical properties of nc-Si: H thin films deposited by layer-by-layer technique

BT Goh, CK Wah, Z Aspanut, SA Rahman - Journal of Materials Science …, 2014 - Springer
Hydrogenated nanocrystalline silicon (nc-Si: H) thin films deposited on c-Si and quartz
substrates by layer-by-layer (LBL) technique using radio-frequency plasma enhanced …

Effect of power on crystallinity and opto-electronic properties of silicon thin films grown using VHF PECVD process

S Juneja, S Kumar - Silicon, 2021 - Springer
The silicon thin films have been deposited using VHF (60 MHz) plasma enhanced chemical
vapor deposition (PECVD) process. The influence of the power (10–50 W), used during the …

Origin of photoluminescence in nanocrystalline Si: H films

AM Ali - Journal of luminescence, 2007 - Elsevier
We have studied the origin of photoluminescence (PL) from hydrogenated nanocrystalline
silicon (nc-Si: H) films produced by a plasma-enhanced chemical vapor deposition …

Correlation between microstructure and properties of hydrogenated Si thin films grown by plasma enhanced chemical vapor deposition under different hydrogen flow …

SB Amor, R Bousbih, R Ouertani, W Dimassi… - Solar energy, 2014 - Elsevier
In order to characterize the surface of nanocrystalline hydrogenated silicon (nc-Si: H) and to
get more insight into the film's growth deposited by plasma enhanced chemical vapor …

Chromium‐Induced Nanocrystallization of a‐Si Thin Films into the Wurtzite Structure

KUM Kumar, MG Krishna - Journal of Nanomaterials, 2008 - Wiley Online Library
Chromium metal‐induced nanocrystallization of amorphous silicon (a‐Si) thin films is
reported. The nanocrystalline nature of these films is confirmed from X‐ray diffraction and …

Room temperature synthesis of nanocrystalline silicon by aluminium induced crystallization for solar cell applications

IYY Bu - Vacuum, 2011 - Elsevier
The aim of this study is to synthesis large area, plastic compatible of p-type nanocrystalline
silicon through conventional sputter system. The growth of and p-type doping of …

Optimized nc-Si: H thin films with enhanced optoelectronic properties prepared by micro-waves PECVD used as an effective silicon surface passivation layer

S El Whibi, L Derbali, P Tristant, C Jaoul… - Journal of Materials …, 2019 - Springer
In this work we investigated a novel approach to elaborate hydrogenated nanocrystalline
silicon (nc-Si: H) thin films using microwave plasma enhanced chemical vapor deposition …

Structural and optical properties of the nc-Si: H thin films irradiated by high energetic ion beams

BT Goh, SK Ngoi, SL Yap, C San Wong, CF Dee… - Journal of non …, 2013 - Elsevier
Hydrogenated nanocrystalline silicon (nc-Si: H) thin films deposited by radio-frequency
plasma enhanced chemical vapour deposition was irradiated by an energetic ion beam …