(57) ABSTRACT A lithographic projection apparatus includes a Substrate table to hold a
Substrate, a projection system to project a patterned beam of radiation onto the Substrate …

(57) ABSTRACT A hydrostatic pad (32) and a hydrostatic pad (34) hold a wafer (W) and a
table (TB) on which the wafer is mounted. The hydrostatic pad (32) maintains the distance …

A lithographic projection apparatus includes a substrate table that holds a substrate, a
projection system that projects a patterned beam of radiation onto the substrate, and a liquid …

(57) ABSTRACT A part of exposure beam through a liquid (LQ) via a projection optical
system (PL) enters a light-transmitting section (44), enters an optical member (41) without …

(57) ABSTRACT A lithographic projection apparatus includes an illumination system that
conditions a radiation beam, a Support structure that holds a patterning device, the …

(57) ABSTRACT A part of exposure beam through a liquid via a projection optical system
enters a light-transmitting section, enters an optical member without passing through gas …

When a transition from a first state where one stage is posi tioned at a first area directly
below projection optical system to which liquid is Supplied to a state where the other stage …

An exposure apparatus and method exposes a substrate via a projection optical system and
liquid. A liquid immersion member having a lower surface and a recovery port at its lower …

When a transition from a first state where one stage is posi tioned at a first area directly
below projection optical system to which liquid is Supplied to a state where the other stage …

US9081298B2 - Apparatus for maintaining immersion fluid in the gap under the projection lens
during wafer exchange using a co-planar member in an immersion lithography machine …