The ability to achieve near-atomic precision in etching different materials when transferring
lithographically defined templates is a requirement of increasing importance for nanoscale …

Materials with the desirable surface wettability are of key importance in diverse applications.
However, most of the existing chemical processes used for surface wettability control are …

Power-modulated (pulsed) plasmas have demonstrated several advantages compared to
continuous wave (CW) plasmas. Specifically, pulsed plasmas can result in a higher etching …

The spread of bacteria through contaminated surfaces is a major issue in healthcare, food
industry, and other economic sectors. The widespread use of antibiotics is not a sustainable …

This handbook will provide engineers with the principles, applications, and solutions
needed to design and manage semiconductor manufacturing operations. Consolidating the …

The architecture, size and density of metal oxide field effect transistors (MOSFETs) as unit
bricks in integrated circuits (ICs) have constantly changed during the past five decades. The …

Graphene is the first engineering electronic material, which is purely two-dimensional: it
consists of two exposed sp 2-hybridized carbon surfaces and has no bulk. Therefore …

In the semiconductors and related industries, the fabrication of nanostructures and
nanopatterns has become progressive demand for achieving near-atomic accuracy and …

The scientific study of plasma discharges and their material interactions has been crucial to
the development of semiconductor process engineering and, by extension, the entire …

Fluorine cold plasmas produced by an electrical discharge in SF 6, CF 4, CHF 3 or C 4 F 8
gases, principally, have two main fields of application. The first and historical application is …