Xi-cam is an extensible platform for data management, analysis and visualization. Xi-cam
aims to provide a flexible and extensible approach to synchrotron data treatment as a …

Recent success of inverse design methodologies in the realm of self-assembled materials
has allowed us to envision an inverse path of discovery where we go from a desired target …

High aspect ratio (HAR) structures found in three-dimensional nand memory structures have
unique process control challenges. The etch used to fabricate channel holes several …

Overlay serves as the pivotal performance indicator for lithography tools, and its prompt and
precise measurement significantly underpins the process yield control. At present, diffraction …

There is considerable interest in developing multimodal characterization frameworks
capable of probing critical properties of complex materials by relying on distinct …

Semiconductor devices continue to shrink in size with every generation. These ever smaller
structures are challenging the resolution limits of current analytical and inline metrology …

The semiconductor industry is continuously pushing the limits of photolithography, with
feature sizes now smaller than 10 nm. To ensure quality, it has become necessary to look …

A block copolymer self-consistent field theory (SCFT) model is used for direct analysis of
experimental X-ray scattering data obtained from thin films of polystyrene-b-poly (methyl …

Extreme ultraviolet (EUV) lithography is one of the most promising printing techniques for
high-volume semiconductor manufacturing at the 14-nm half-pitch device node and beyond …

摘要掠入射小角X 射线散射(GISAXS) 可进行光栅纳米结构的高分辨无损测量,
有望应对半导体在未来节点的测量挑战. 然而, 传统的GISAXS 方法主要用于线光栅的测量 …