An efficient CFD model for the deposition of alumina from a gas mixture consisting of AlCl 3,
CO 2, HCl, H 2 and H 2 S in an industrial CVD reactor with multiple disks and a rotating …

The uniformity of deposited film is a critical quality indicator for the product by chemical
vapor deposition (CVD). Quality control of deposited film remains a challenging task …

High indium-content group-III nitrides are of interest to further expand upon our ability to
produce highly efficient optical emitters at longer visible/IR wavelengths or to broaden …

Highly indium-rich group-III nitrides are attracting attention for advancing our capacity to
create highly effective optical emitters at extended visible/IR wavelengths or for enhancing …

Self-sustained periodic flows can be found in the laminar flow regime of a vertical,
stagnation point CVD reactor. Here, we examine the effect of flow periodicity on the …

Herein, a 3D computational fluid dynamic (CFD) model of vertical reactor designed for SiC
coating deposition is proposed. The CFD model incorporates compressive multispecies …

High indium-content group III nitrides are of interest to further expand upon our ability to
produce highly efficient optical emitters at longer visible/IR wavelengths or to broaden …

Chemical vapor deposition (CVD) is a widely used technique for manufacturing thin films,
which has been carried out for decades with a huge range of applications. The purpose of …

Chemical Vapor Deposition CVD is a widely used process for producing thin solid films and,
nanoscale structures from gaseous reactants. Its applications range from coatings for wear …