Transparent amorphous oxide semiconductor thin film transistor

JY Kwon, DJ Lee, KB Kim - Electronic Materials Letters, 2011 - Springer
Thin film transistors (TFTs) with oxide semiconductors have drawn great attention in the last
few years, especially for large area electronic applications, such as high resolution active …

Indium–gallium–zinc–oxide thin-film transistors: Materials, devices, and applications

Y Zhu, Y He, S Jiang, L Zhu, C Chen… - Journal of …, 2021 - iopscience.iop.org
Since the invention of amorphous indium–gallium–zinc–oxide (IGZO) based thin-film
transistors (TFTs) by Hideo Hosono in 2004, investigations on the topic of IGZO TFTs have …

Metal oxide semiconductor thin-film transistors for flexible electronics

L Petti, N Münzenrieder, C Vogt, H Faber… - Applied Physics …, 2016 - pubs.aip.org
The field of flexible electronics has rapidly expanded over the last decades, pioneering
novel applications, such as wearable and textile integrated devices, seamless and …

Role of dopants as a carrier suppressor and strong oxygen binder in amorphous indium-oxide-based field effect transistor

S Parthiban, JY Kwon - Journal of Materials Research, 2014 - cambridge.org
In this review, we discuss the recent developments of high-performance and improved-
stability of indium-oxide-based transparent amorphous-oxide semiconductor (TAOS) thin …

The influence of the gate dielectrics on threshold voltage instability in amorphous indium-gallium-zinc oxide thin film transistors

J Lee, JS Park, YS Pyo, DB Lee, EH Kim… - Applied Physics …, 2009 - pubs.aip.org
We investigated the threshold voltage (V th) instability for various gate dielectrics (⁠ SiN x
and SiO x⁠) in amorphous indium-gallium-zinc oxide (⁠ a-IGZO) thin film transistors (TFTs) …

Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition

X Li, HL Lu, HP Ma, JG Yang, JX Chen, W Huang… - Current Applied …, 2019 - Elsevier
Thin Ga 2 O 3 films were grown on Si (100) using trimethylgallium (TMG) and oxygen as the
precursors through plasma-enhanced atomic layer deposition. The depositions were made …

Effects of ambient atmosphere on the transfer characteristics and gate-bias stress stability of amorphous indium-gallium-zinc oxide thin-film transistors

SY Sung, JH Choi, UB Han, KC Lee, JH Lee… - Applied physics …, 2010 - pubs.aip.org
We investigated the transfer characteristics and the gate-bias stability of amorphous indium-
gallium-zinc oxide thin-film transistors when the channel layer was exposed to hydrogen …

A Flexible IGZO Thin-Film Transistor With Stacked -Based Dielectrics Fabricated at Room Temperature

HH Hsu, CY Chang, CH Cheng - IEEE Electron Device Letters, 2013 - ieeexplore.ieee.org
This letter demonstrates the feasibility of full room temperature InGaZnO thin-film transistor
(TFT) using trilayer gate dielectric on flexible substrate. Through integrating high …

Effect of channel thickness on density of states in amorphous InGaZnO thin film transistor

SY Lee, DH Kim, E Chong, YW Jeon, DH Kim - Applied Physics Letters, 2011 - pubs.aip.org
We report on the origin of threshold voltage shift with the thickness of amorphous InGaZnO
channel layer deposited by rf magnetron sputter at room temperature, using density of states …

[HTML][HTML] Energy band offsets of dielectrics on InGaZnO4

DC Hays, BP Gila, SJ Pearton, F Ren - Applied Physics Reviews, 2017 - pubs.aip.org
Thin-film transistors (TFTs) with channels made of hydrogenated amorphous silicon (a-Si: H)
and polycrystalline silicon (poly-Si) are used extensively in the display industry. Amorphous …