Ferroelectric hafnium oxide films for in‐memory computing applications

Z Li, T Wang, J Yu, J Meng, Y Liu, H Zhu… - Advanced Electronic …, 2022 - Wiley Online Library
Traditional von Neumann architecture is facing severe challenges due to separated physical
structure of memory and processing units, which inspires the development of in‐memory …

Insights into the operation of negative capacitance FinFET for low power logic applications

RK Jaisawal, PN Kondekar, S Yadav, P Upadhyay… - Microelectronics …, 2022 - Elsevier
In the incessant search to overcome the power densities and energy efficient limitations,
performance matrix of emerging electronic devices are being explored inevitably to find the …

Insight into threshold voltage and drain induced barrier lowering in negative capacitance field effect transistor

B Awadhiya, PN Kondekar, S Yadav… - Transactions on Electrical …, 2021 - Springer
In this paper, we have discussed threshold voltage and drain induced barrier lowering in
NCFET. Threshold voltage in NCFET is lower as compared to MOSFET which is mainly …

Negative capacitance based phase-transition FET for low power applications: Device-circuit co-design

S Yadav, PN Kondekar, P Upadhyay… - Microelectronics Journal, 2022 - Elsevier
In this article, we have performed a comprehensive study into the Phase Transition Material
based FinFET (PT-FinFET) device's capabilities for low-power, energy-efficient applications …

Performance estimation of non-hysteretic negative capacitance FinFET based SRAM

S Yadav, PN Kondekar, B Awadhiya - Microelectronics Journal, 2023 - Elsevier
In this paper, a detailed evaluation of negative capacitance FinFET (NC-FinFET) based
volatile static random access memory (6T-NCSRAM) is carried out by utilizing LK equation …

Temperature- and Frequency-Dependent Ferroelectric Characteristics of Metal-Ferroelectric-Metal Capacitors with Atomic-Layer-Deposited Undoped HfO2 Films

CH Jang, HS Kim, H Kim, HY Cha - Materials, 2022 - mdpi.com
In this study, we evaluated the temperature-and frequency-dependent ferroelectric
characteristics of TiN/undoped HfO2/TiN metal-ferroelectric-metal (MFM) capacitors in which …

Comparative investigation of passive voltage amplification in ferroelectric-dielectric heterostructure

CM Archana, B Awadhiya… - Journal of Physics …, 2024 - iopscience.iop.org
This paper investigates the ferroelectric-dielectric heterostructure with a fixed dielectric oxide
and different ferroelectric oxides. This study is focused on the enhancement of capacitance …

Comparative study of negative capacitance field effect transistors with different doped hafnium oxides

B Awadhiya, S Yadav - Microelectronics Journal, 2023 - Elsevier
Abstract Negative Capacitance Field Effect Transistors are well known for their superior
performance over MOSFET and are a viable candidate to succeed the baseline FET in time …

Passive Voltage Amplification in FE-FE-DE Heterostructure

B Awadhiya, S Yadav, Y Nanjappa, A Pahuja… - IEEE …, 2024 - ieeexplore.ieee.org
In this article, we have studied passive voltage amplification in FE-FE-DE heterostructure.
We have stacked two different ferroelectric oxides; one is second-order transition …

[HTML][HTML] Effect of TiN electrodes and Gd-doping on HfO2 structural properties

MM Abdallah, EV Skopin, F Fillot… - Journal of Applied …, 2024 - pubs.aip.org
The ferroelectric properties evidenced on undoped hafnium oxide, which are similar to those
of doped HfO 2⁠, are rather unexpected since it is believed that doping is a prerequisite for …