Physics of laser-driven tin plasma sources of EUV radiation for nanolithography
OO Versolato - Plasma Sources Science and Technology, 2019 - iopscience.iop.org
Laser-produced transient tin plasmas are the sources of extreme ultraviolet (EUV) light at
13.5 nm wavelength for next-generation nanolithography, enabling the continued …
13.5 nm wavelength for next-generation nanolithography, enabling the continued …
Microdroplet-tin plasma sources of EUV radiation driven by solid-state-lasers (Topical Review)
Plasma produced from molten-tin microdroplets generates extreme ultraviolet light for state-
of-the-art nanolithography. Currently, CO 2 lasers are used to drive the plasma. In the future …
of-the-art nanolithography. Currently, CO 2 lasers are used to drive the plasma. In the future …
Prominent radiative contributions from multiply-excited states in laser-produced tin plasma for nanolithography
Extreme ultraviolet (EUV) lithography is currently entering high-volume manufacturing to
enable the continued miniaturization of semiconductor devices. The required EUV light, at …
enable the continued miniaturization of semiconductor devices. The required EUV light, at …
Physical processes in EUV sources for microlithography
VY Banine, KN Koshelev… - Journal of Physics D …, 2011 - iopscience.iop.org
The source is an integral part of an extreme ultraviolet lithography (EUVL) tool. Such a
source, as well as the EUVL tool, has to fulfil very high demands both technical and cost …
source, as well as the EUVL tool, has to fulfil very high demands both technical and cost …
Spectroscopy of highly charged ions and its relevance to EUV and soft x-ray source development
The primary requirement for the development of tools for extreme ultraviolet lithography
(EUVL) has been the identification and optimization of suitable sources. These sources must …
(EUVL) has been the identification and optimization of suitable sources. These sources must …
Extreme ultraviolet light from a tin plasma driven by a 2-µm-wavelength laser
An experimental study of laser-produced plasmas is performed by irradiating a planar tin
target by laser pulses, of 4.8 ns duration, produced from a KTP-based 2-µm-wavelength …
target by laser pulses, of 4.8 ns duration, produced from a KTP-based 2-µm-wavelength …
Efficient Generation of Extreme Ultraviolet Light From :YAG-Driven Microdroplet-Tin Plasma
We experimentally investigate the emission of EUV light from a mass-limited laser-produced
plasma over a wide parameter range by varying the diameter of the targeted tin …
plasma over a wide parameter range by varying the diameter of the targeted tin …
Применение лазеров в нанотехнологии: получение наночастиц и наноструктур методами лазерной абляции и лазерной нанолитографии
ГН Макаров - Успехи физических наук, 2013 - ufn.ru
В настоящее время одним из наиболее интенсивно развивающихся направлений в
области естественных наук является исследование малоразмерных объектов ì …
области естественных наук является исследование малоразмерных объектов ì …
EUV spectra of Gd and Tb ions excited in laser-produced and vacuum spark plasmas
SS Churilov, RR Kildiyarova, AN Ryabtsev… - Physica …, 2009 - iopscience.iop.org
Extreme UV spectra of the gadolinium and terbium ions excited in the laser-produced
plasma and vacuum spark sources were recorded in the 40–120 Å region and investigated …
plasma and vacuum spark sources were recorded in the 40–120 Å region and investigated …
Laser applications in nanotechnology: nanofabrication using laser ablation and laser nanolithography
GN Makarov - Physics-Uspekhi, 2013 - iopscience.iop.org
The fact that nanoparticles and nanomaterials have fundamental properties different both
from their constituent atoms or molecules and from their bulk counterparts has stimulated …
from their constituent atoms or molecules and from their bulk counterparts has stimulated …