Aluminum nitride (AlN) is one of the few electrically insulating materials with excellent
thermal conductivity, but high-quality films typically require exceedingly hot deposition …

Aluminum nitride (AlN) plays a key role in modern power electronics and deep-ultraviolet
photonics, where an understanding of its thermal properties is essential. Here, we measure …

The initial stages of metal organic chemical vapor deposition (MOCVD) of AlN on epitaxial
graphene at temperatures in excess of 1200° C have been rationalized. The use of epitaxial …

Metal organic chemical vapor deposition (MOCVD) of group III nitrides on graphene
heterostructures offers new opportunities for the development of flexible optoelectronic …

Scandium-alloying of aluminum nitride (AlScN) enhances the piezoelectric properties of the
material and increases the performance of piezoelectric microelectromechanical systems …

Amongst the piezoelectric thin films suited for microelectromechanical systems (MEMS), AlN
has gained particular technological relevance due to its unique material properties (large …

Abstract High-quality AlGaN/GaN/AlN heterostructures with thin GaN channel and thick AlN
buffer layer were grown by metal organic chemical vapor deposition (MOCVD) on SiC …

Atomic layer deposition (ALD) of aluminum nitride (AlN) using in situ atomic layer annealing
(ALA) is studied for microelectromechanical systems (MEMS). Effective piezoelectric in …

The influence of the microstructure on the thermal behavior of cathodic arc deposited TiAlN
coatings was studied as a function of isothermal annealing. Two compositionally similar but …

This chapter is a general introduction to the properties and applications of gallium nitride
(GaN) and related materials. In the first part, after an historical background on the relevant …