Due to the unique set of properties possessed by ZnO, thin films of ZnO have received more
and more interest in the last 20 years as a potential material for applications such as thin-film …

In the past decade, atomic layer deposition (ALD) has become an important thin film
deposition technique for applications in nanoelectronics, catalysis, and other areas due to its …

Epitaxial β‐Ga2O3 layers have been grown on β‐Ga2O3 (100) substrates using metal‐
organic vapor phase epitaxy. Trimethylgallium and pure oxygen or water were used as …

In this paper, cheap and efficient photovoltaic cells based on ZnO/Si heterostructure are
discussed. These cells contain zinc oxide nanorods (ZnO NR) grown by a low temperature …

Synthesizing nanopores which mimic the functionality of ion-selective biological channels
has been a challenging yet promising approach to advance technologies for precise ion–ion …

As devices are scaled down to the nanometer regime, the need for excellent conformality
and atomic thickness controllability becomes immense. Because of the recent …

Concerns on food safety, and need for high quality and extended shelf-life of packaged
foods have promoted the development of antibacterial barrier packaging materials. Few …

Thermite materials feature very exothermic solid-state redox reactions. However, the energy
release rates of traditional thermite mixtures are limited by the reactant diffusion velocities. In …

A combination of the atomic layer deposition (ALD) and molecular layer deposition (MLD)
techniques is successfully employed to fabricate thin films incorporating superlattice …

A top-gate-structured charge-trap-type memory thin-film transistors (CTM-TFTs) using In-Ga–
Zn-O (IGZO) channel and ZnO charge-trap layers were proposed to investigate effects of …