Superconformal film growth: from smoothing surfaces to interconnect technology

TP Moffat, TM Braun, D Raciti… - Accounts of Chemical …, 2023 - ACS Publications
Conspectus Electronics manufacturing involves Cu electrodeposition to form 3D circuitry of
arbitrary complexity. This ranges from nanometer-wide interconnects between individual …

Stabilizing zinc electrodeposition in a battery anode by controlling crystal growth

S Jin, D Zhang, A Sharma, Q Zhao, Y Shao, P Chen… - Small, 2021 - Wiley Online Library
Reversible electrodeposition of metals at liquid‐solid interfaces is a requirement for long
cycle life in rechargeable batteries that utilize metals as anodes. The process has been …

[图书][B] Fundamentals of electrochemical deposition

M Paunovic, M Schlesinger - 2006 - books.google.com
Excellent teaching and resource material... it is concise, coherently structured, and easy to
read... highly recommended for students, engineers, and researchers in all related fields." …

Improving the performance of aqueous zinc‐ion batteries by inhibiting zinc dendrite growth: recent progress

VC Ho, H Lim, MJ Kim, J Mun - Chemistry–An Asian Journal, 2022 - Wiley Online Library
Aqueous zinc‐ion batteries (ZIBs) are promising candidates for the next‐generation high‐
energy storage devices, owing to their resource availability, low cost, eco‐friendliness, and …

Copper foam structures with highly porous nanostructured walls

HC Shin, M Liu - Chemistry of materials, 2004 - ACS Publications
A variety of copper foams with highly open porous walls have been successfully sculptured
using the gas evolved in an electrochemical deposition process. The pore sizes and wall …

The chemistry of additives in damascene copper plating

PM Vereecken, RA Binstead… - IBM Journal of …, 2005 - ieeexplore.ieee.org
Copper plating baths used for forming integrated circuit interconnects typically contain three
or four component additive mixtures which facilitate the superfilling of via holes and trench …

Superconformal film growth: Mechanism and quantification

TP Moffat, D Wheeler, MD Edelstein… - IBM Journal of …, 2005 - ieeexplore.ieee.org
Superconformal electrodeposition of copper is explained by the recently developed
curvature-enhanced-accelerator coverage (CEAC) model, which is based on the …

Investigation of novel leveler Rhodamine B on copper superconformal electrodeposition of microvias by theoretical and experimental studies

Y Li, P Ren, Y Zhang, R Li, J Zhang, P Yang, A Liu… - Applied Surface …, 2023 - Elsevier
Achieving void-defect copper filling by electrodeposition on microvias is essentially
important. Rhodamine B (RhB) is of excellent suppressing ability based on electrochemical …

Electrodeposition of copper in the SPS-PEG-Cl additive system: I. kinetic measurements: Influence of SPS

TP Moffat, D Wheeler, D Josell - Journal of The Electrochemical …, 2004 - iopscience.iop.org
The kinetics of copper electrodeposition from an acidified cupric sulfate electrolyte
containing SPS-PEG-Cl were examined. Voltammetric and chronoamperometric …

Superconformal electrodeposition of copper

TP Moffat, D Wheeler, WH Huber… - … and Solid-State Letters, 2001 - iopscience.iop.org
A model of superconformal electrodeposition is presented based on a local growth velocity
that is proportional to coverage of a catalytic species at the metal/electrolyte interface. The …