Fundamental study towards a better understanding of low pressure radio-frequency plasmas for industrial applications
YX Liu, QZ Zhang, K Zhao, YR Zhang, F Gao… - Chinese …, 2022 - iopscience.iop.org
Two classic radio-frequency (RF) plasmas, ie, the capacitively and the inductively coupled
plasmas (CCP and ICP), are widely employed in material processing, eg, etching and thin …
plasmas (CCP and ICP), are widely employed in material processing, eg, etching and thin …
Gas breakdown in radio-frequency field within MHz range: a review of the state of the art
Low-temperature plasmas (LTPs) driven by 1–100 MHz radio-frequency (MRF) are essential
for many industrial applications, and their breakdown characteristics are different to that of …
for many industrial applications, and their breakdown characteristics are different to that of …
A generalized external circuit model for electrostatic particle-in-cell simulations
A fully self-consistent second order accuracy model for coupling a generalized external
circuit and a one-dimensional bounded electrode-driven plasma was proposed in this …
circuit and a one-dimensional bounded electrode-driven plasma was proposed in this …
Best impedance matching seeking of single-frequency capacitively coupled plasmas by numerical simulations
Impedance matching can maximize the absorbed power transferred to the plasma load and
minimize the reflected power, making it critical and indispensable for capacitively coupled …
minimize the reflected power, making it critical and indispensable for capacitively coupled …
Disparity between current and voltage driven capacitively coupled radio frequency discharges
In simulation as well as analytical modeling studies of low-pressure capacitively coupled
radio frequency (CCRF) discharges, the assumption of both a driving voltage source or a …
radio frequency (CCRF) discharges, the assumption of both a driving voltage source or a …
The effects of match circuit on the breakdown process of capacitively coupled plasma driven by radio frequency
The breakdown process of capacitively coupled plasma (CCP) in the presence of a
matching network is rarely studied, even though it is the indispensable part of the most …
matching network is rarely studied, even though it is the indispensable part of the most …
Self-consistent simulation of the impedance matching network for single frequency capacitively coupled plasma
Matching networks are of vital importance for capacitively coupled plasmas (CCPs) to
maximize the power transferred to the plasma discharge. The nonlinear interaction between …
maximize the power transferred to the plasma discharge. The nonlinear interaction between …
Influence of Matching Network on the Discharge Characteristic of Dual—Frequency Capacitively Coupled Ar Plasma
Q Yuan, L Shan, G Yin, Y Huang… - Contributions to Plasma …, 2024 - Wiley Online Library
This paper examines the impact of different L− π L-π type external matching networks on the
discharge characteristics of dual‐frequency capacitively coupled plasma. A nonlinear global …
discharge characteristics of dual‐frequency capacitively coupled plasma. A nonlinear global …
Simulation of nonlinear standing wave excitation in very-high-frequency asymmetric capacitive discharges: roles of radial plasma density profile and rf power
FJ Zhou, K Zhao, DQ Wen, JK Liu… - … Sources Science and …, 2021 - iopscience.iop.org
It is recognized that in large-area, very-high-frequency capacitively coupled plasma (VHF
CCP) reactors, the higher harmonics generated by nonlinear sheath motion can lead to …
CCP) reactors, the higher harmonics generated by nonlinear sheath motion can lead to …
A numerical approach for nonlinear transmission line analysis with bidirectional coupling to lumped-element and particle-in-cell models
In this article, an iterative method for nonlinear transmission lines (TLs) based on the Lax-
Wendroff method has been established to describe a bidirectional coupling model of …
Wendroff method has been established to describe a bidirectional coupling model of …