Using a semiempirical rule based on a range of existing hard materials, Liu and Cohen
predicted that some of the crystalline forms of C3N4 might have values of bulk modulus …

The effect of the addition of nitrogen to plasmas during the CVD growth of diamond films on
field emission properties has been studied. Ultrananocrystalline diamond with 5–15 nm …

Diamond has been considered as a material of choice for next-generation cold cathode
materials. The strong sp3 bonding character in diamond leads to a material with unique …

The mechanisms of nitrogen incorporation in diamond are still an unsolved riddle. This is
mainly due to the complexity of the processes involved as they not only depend on empirical …

Diamond films are prepared by microwave plasma-enhanced chemical-vapor deposition on
Si (100) substrates using the H 2–Ar–CH 4 gases. Raman scattering data, including the …

This research explores the complex influence of nitrogen concentration and substrate
temperature on the resultant properties of polycrystalline diamond (PCD) films grown by …

The plasma chemistry of NO has been investigated in gas mixtures with oxygen and/or
hydrocarbon and Ar as carrier gas. Surface wave discharges operating at microwave …

The mechanical properties of polycrystalline diamond coatings with thickness varying from
0.92 to 44.65 μm have been analysed. The tested samples have been grown on silicon …

In a distributed antenna array reactor, microwave H 2-CH 4-CO 2 plasmas with admixture of
N 2 used for the low-temperature deposition of nanocrystalline diamond (NCD) films are …

The epitaxial lateral growth of single-crystal diamond (SCD) using a plate-to-plate
microwave plasma chemical vapor deposition (MPCVD) reactor under high pressure is …