Low oxide trench dishing shallow trench isolation chemical mechanical planarization polishing
X Shi, JD Rose, H Zhou, KP Murella… - US Patent …, 2022 - Google Patents
The present invention discloses STI CMP polishing compositions, methods and systems that
significantly reduce oxide trench dishing and improve over-polishing window stability in …
significantly reduce oxide trench dishing and improve over-polishing window stability in …