Physics of laser-driven tin plasma sources of EUV radiation for nanolithography
OO Versolato - Plasma Sources Science and Technology, 2019 - iopscience.iop.org
Laser-produced transient tin plasmas are the sources of extreme ultraviolet (EUV) light at
13.5 nm wavelength for next-generation nanolithography, enabling the continued …
13.5 nm wavelength for next-generation nanolithography, enabling the continued …
Spectroscopy of highly charged ions and its relevance to EUV and soft x-ray source development
The primary requirement for the development of tools for extreme ultraviolet lithography
(EUVL) has been the identification and optimization of suitable sources. These sources must …
(EUVL) has been the identification and optimization of suitable sources. These sources must …
Extreme ultraviolet light from a tin plasma driven by a 2-µm-wavelength laser
An experimental study of laser-produced plasmas is performed by irradiating a planar tin
target by laser pulses, of 4.8 ns duration, produced from a KTP-based 2-µm-wavelength …
target by laser pulses, of 4.8 ns duration, produced from a KTP-based 2-µm-wavelength …
Efficient Generation of Extreme Ultraviolet Light From :YAG-Driven Microdroplet-Tin Plasma
We experimentally investigate the emission of EUV light from a mass-limited laser-produced
plasma over a wide parameter range by varying the diameter of the targeted tin …
plasma over a wide parameter range by varying the diameter of the targeted tin …
Characterization of angularly resolved EUV emission from 2-µm-wavelength laser-driven Sn plasmas using preformed liquid disk targets
The emission properties of tin plasmas, produced by the irradiation of preformed liquid tin
targets by several-ns-long 2 µm-wavelength laser pulses, are studied in the extreme …
targets by several-ns-long 2 µm-wavelength laser pulses, are studied in the extreme …
Characterization of optical depth for laser produced plasma extreme ultraviolet source
T Wang, Z Hu, L He, N Lin, Y Leng, W Chen - Vacuum, 2025 - Elsevier
This study investigates the emission mechanism of laser-produced plasma extreme
ultraviolet source (LPP-EUV). In the experiment, the EUV radiation is generated by a 1064 …
ultraviolet source (LPP-EUV). In the experiment, the EUV radiation is generated by a 1064 …
Laser wavelength dependence on angular emission dynamics of Nd: YAG laser-produced Sn plasmas
JR Freeman, SS Harilal, B Verhoff… - Plasma Sources …, 2012 - iopscience.iop.org
We investigated the laser wavelength effect on angular atomic and ionic emission from laser-
produced Sn plasma, since it is regarded as a viable candidate for an EUV lithography …
produced Sn plasma, since it is regarded as a viable candidate for an EUV lithography …
Recent progress in source development for extreme UV lithography
The continuation of Moore's law for semiconductor fabrication envisages the introduction of
extreme ultraviolet lithography (EUVL) based on a source wavelength of 13.5 nm for high …
extreme ultraviolet lithography (EUVL) based on a source wavelength of 13.5 nm for high …
Laser-produced plasma light source for extreme-ultraviolet lithography applications
RS Abhari, B Rollinger, AZ Giovannini… - Journal of Micro …, 2012 - spiedigitallibrary.org
High-brightness extreme-ultraviolet light sources are required for mask inspections and
metrology, including mask blank inspection, actinic pattern inspection, and aerial image …
metrology, including mask blank inspection, actinic pattern inspection, and aerial image …
Angular and energy distribution of Sn ion debris ejected from a laser-produced plasma source, for laser power densities in the range suitable for extreme ultraviolet …
In this paper, experimental results are presented for the spatial and energy distributions of
charge-discriminated Sn ions ejected from laser-produced plasmas. The plasmas were …
charge-discriminated Sn ions ejected from laser-produced plasmas. The plasmas were …