Using a particle-in-cell simulation technique, we investigate the plasma and ionization
asymmetry, higher harmonics generation, and electron and ion energy distribution function …

Plasma asymmetry generation in capacitively coupled plasma (CCP) discharges provides
control over vital parameters that are useful in many plasma processing applications. In this …

The effects of the simultaneous presence of two different types of plasma asymmetry, viz,
geometric and electrical, on low-pressure capacitively coupled argon discharges are studied …

A particle-in-cell simulation study is performed to investigate the discharge asymmetry,
higher harmonic generations and electron heating mechanism in a low pressure …

We investigate the energy and angular distributions of ions reaching the electrodes in low-
pressure, capacitively coupled oxygen radio-frequency discharges. These distributions, as …

The electrical asymmetry effect (EAE) enables separate control of the ion flux and the mean
ion energy in capacitively coupled plasmas (CCP). While a variety of plasma processing …

This paper examines the impact of different L− π L-π type external matching networks on the
discharge characteristics of dual‐frequency capacitively coupled plasma. A nonlinear global …

In the etching process, a bias source is usually applied to the bottom electrode in inductively
coupled plasmas (ICPs) to achieve independent control of the ion flux and ion energy. In this …

Capacitively coupled radio frequency (CCRF) plasmas are widely studied in last decades
due to the versatile applicability of energetic ions, chemically active species, radicals, and …

We investigated the effects of amplitude modulated (AM) capacitively coupled Ar discharge
plasma on the ion energy distribution function (IEDF) and the ion angular distribution …