Physics of laser-driven tin plasma sources of EUV radiation for nanolithography
OO Versolato - Plasma Sources Science and Technology, 2019 - iopscience.iop.org
Laser-produced transient tin plasmas are the sources of extreme ultraviolet (EUV) light at
13.5 nm wavelength for next-generation nanolithography, enabling the continued …
13.5 nm wavelength for next-generation nanolithography, enabling the continued …
Microdroplet-tin plasma sources of EUV radiation driven by solid-state-lasers (Topical Review)
Plasma produced from molten-tin microdroplets generates extreme ultraviolet light for state-
of-the-art nanolithography. Currently, CO 2 lasers are used to drive the plasma. In the future …
of-the-art nanolithography. Currently, CO 2 lasers are used to drive the plasma. In the future …
Spectroscopy of highly charged ions and its relevance to EUV and soft x-ray source development
The primary requirement for the development of tools for extreme ultraviolet lithography
(EUVL) has been the identification and optimization of suitable sources. These sources must …
(EUVL) has been the identification and optimization of suitable sources. These sources must …
Extreme ultraviolet light from a tin plasma driven by a 2-µm-wavelength laser
An experimental study of laser-produced plasmas is performed by irradiating a planar tin
target by laser pulses, of 4.8 ns duration, produced from a KTP-based 2-µm-wavelength …
target by laser pulses, of 4.8 ns duration, produced from a KTP-based 2-µm-wavelength …
High-energy ions from Nd: YAG laser ablation of tin microdroplets: comparison between experiment and a single-fluid hydrodynamic model
DJ Hemminga, L Poirier, MM Basko… - Plasma Sources …, 2021 - iopscience.iop.org
We present the results of a joint experimental and theoretical study of plasma expansion
arising from Nd: YAG laser ablation (laser wavelength λ= 1.064 μm) of tin microdroplets in …
arising from Nd: YAG laser ablation (laser wavelength λ= 1.064 μm) of tin microdroplets in …
Efficient Generation of Extreme Ultraviolet Light From :YAG-Driven Microdroplet-Tin Plasma
We experimentally investigate the emission of EUV light from a mass-limited laser-produced
plasma over a wide parameter range by varying the diameter of the targeted tin …
plasma over a wide parameter range by varying the diameter of the targeted tin …
A review of low density porous materials used in laser plasma experiments
K Nagai, CSA Musgrave, W Nazarov - Physics of plasmas, 2018 - pubs.aip.org
This review describes and categorizes the synthesis and properties of low density porous
materials, which are commonly referred to as foams and are utilized for laser plasma …
materials, which are commonly referred to as foams and are utilized for laser plasma …
Enhancement of extreme ultraviolet emission from a CO2 laser-produced Sn plasma using a cavity target
Y Ueno, G Soumagne, A Sumitani, A Endo… - Applied Physics …, 2007 - pubs.aip.org
We demonstrated enhancement of in-band conversion efficiency (CE) at 13.5 nm of the
extreme ultraviolet (EUV) emission from a tin (Sn) cavity target irradiated by a CO 2 laser …
extreme ultraviolet (EUV) emission from a tin (Sn) cavity target irradiated by a CO 2 laser …
Characterization of angularly resolved EUV emission from 2-µm-wavelength laser-driven Sn plasmas using preformed liquid disk targets
The emission properties of tin plasmas, produced by the irradiation of preformed liquid tin
targets by several-ns-long 2 µm-wavelength laser pulses, are studied in the extreme …
targets by several-ns-long 2 µm-wavelength laser pulses, are studied in the extreme …
Extreme ultraviolet source at 6.7 nm based on a low-density plasma
T Higashiguchi, T Otsuka, N Yugami, W Jiang… - Applied Physics …, 2011 - pubs.aip.org
We demonstrate an efficient extreme ultraviolet (EUV) source for operation at λ= 6.7 nm by
optimizing the optical thickness of gadolinium (Gd) plasmas. Using low initial density Gd …
optimizing the optical thickness of gadolinium (Gd) plasmas. Using low initial density Gd …