US20230408913A1 - Lithography method to form structures with slanted angle - Google Patents
US20230408913A1 - Lithography method to form structures with slanted angle - Google Patents …

The present disclosure generally relates to methods of forming optical devices comprising
nanostructures disposed on transparent substrates. A first process of forming the …

Methods for patterning of multi-depth layers for the fabrication of optical devices are
provided. In one embodiment, a method is provided that includes disposing a resist layer …

An optical grating component may include a substrate, and an optical grating, the optical
grating being disposed on the substrate. The optical grating may include a plurality of …

Methods for patterning of multi-depth layers for the fabri cation of optical devices are
provided. In one embodiment, a method is provided that includes disposing a resist layer …

Optical grating components and methods of forming are provided. In some embodiments, a
method includes provid ing a substrate, and etching a plurality of trenches into the substrate …