[PDF][PDF] Recent progress in metal-organic chemical vapor deposition of N-polar group-III nitrides

S Keller, H Li, M Laurent, Y Hu, N Pfaff… - Semiconductor …, 2014 - researchgate.net
Progress in metal-organic chemical vapor deposition of high quality () 0001 N-polar (Al, Ga,
In) N films on sapphire, silicon carbide and silicon substrates is reviewed with focus on key …

N-polar GaN epitaxy and high electron mobility transistors

MH Wong, S Keller, SD Nidhi… - Semiconductor …, 2013 - iopscience.iop.org
This paper reviews the progress of N-polar ($000\mathop 1\limits^\_ $) GaN high frequency
electronics that aims at addressing the device scaling challenges faced by GaN high …

High breakdown voltage in RF AlN/GaN/AlN quantum well HEMTs

A Hickman, R Chaudhuri, SJ Bader… - IEEE Electron …, 2019 - ieeexplore.ieee.org
In evaluating GaN high-electron mobility transistors (HEMTs) for high-power applications, it
is crucial to consider the device-level breakdown characteristics. This letter replaces the …

Polarity in GaN and ZnO: Theory, measurement, growth, and devices

J Zuniga-Perez, V Consonni, L Lymperakis… - Applied Physics …, 2016 - pubs.aip.org
The polar nature of the wurtzite crystalline structure of GaN and ZnO results in the existence
of a spontaneous electric polarization within these materials and their associated alloys (Ga …

High breakdown voltage and low-current dispersion in AlGaN/GaN HEMTs with high-quality AlN buffer layer

JG Kim, C Cho, E Kim, JS Hwang… - IEEE Transactions on …, 2021 - ieeexplore.ieee.org
We have successfully grown AlGaN/GaN high electron mobility transistor (HEMT) structure
on the high-quality undoped thick AlN buffer layer with large band offset to replace the …

N-polar GaN: Epitaxy, properties, and device applications

S Mohanty, K Khan, E Ahmadi - Progress in Quantum Electronics, 2023 - Elsevier
Abstract In recent years, Gallium Nitride (GaN) has been established as a material of choice
for high power switching, high power RF and lighting applications. In c-direction, depending …

Graded AlGaN channel transistors for improved current and power gain linearity

S Bajaj, Z Yang, F Akyol, PS Park… - … on Electron Devices, 2017 - ieeexplore.ieee.org
We report on the small-signal high frequency characteristics of highly scaled graded AlGaN
channel polarization-doped field-effect transistors (PolFETs) that show constant current gain …

Ultrascaled InAlN/GaN high electron mobility transistors with cutoff frequency of 400 GHz

Y Yue, Z Hu, J Guo, B Sensale-Rodriguez… - Japanese Journal of …, 2013 - iopscience.iop.org
We report on 30-nm-gate-length InAlN/AlN/GaN/SiC high-electron-mobility transistors
(HEMTs) with a record current gain cutoff frequency (f T) of 400 GHz. Although the high drain …

Passivation schemes for ScAlN-barrier mm-wave high electron mobility transistors

MB Tahhan, JA Logan, MT Hardy… - … on Electron Devices, 2022 - ieeexplore.ieee.org
This article presents improvements of large-signal RF power performance at Ka-band of
gallium nitride high electron mobility transistors (HEMTs) utilizing a scandium aluminum …

GaN high electron mobility transistors for sub-millimeter wave applications

DS Lee, Z Liu, T Palacios - Japanese Journal of Applied Physics, 2014 - iopscience.iop.org
This paper reviews different technologies recently developed to push the performance of
GaN-based high electron mobility transistors (HEMTs) into sub-mm wave frequencies. To …