The high-quality and conformal thin film is of great importance to performances of functional
materials and devices with high aspect ratio nanostructures. Atomic layer deposition (ALD) …

Chemical vapor deposition (CVD) is an established process for the production of thin solid
films for industrial and scientific applications for more than 30 years. CVD is a multiscale …

When composition and crystallographic structure remain constant, film properties mainly
depend on microstructure and surface morphology. In this case, the proper modeling of a …

Α multiscale modeling framework, linking the operating parameters of a low pressure
plasma reactor with the surface roughness being formed on the etched substrate, is …

Experiments and computations are performed to model the chemical vapor deposition of
iron (Fe) from iron pentacarbonyl (Fe (CO) 5). The behavior of the deposition rate is …

A multiscale computational framework for coupling the multiple length scales in chemical
vapor deposition (CVD) processes is implemented for studying the effect of the prevailing …

The deposition limiting step during the chemical vapor deposition (CVD) process of a film
can be identified by the Arrhenius plot, which shows the effect of the wafer temperature on …

Η διεργασία χημικής απόθεσης από ατμό (ΧΑΑ) αποτελεί μία από τις βασικές διεργασίες
παραγωγής λεπτών στερεών υμενίων. Πραγματοποιείται σε αντιδραστήρες εξοπλισμένους με …

Chemical Vapor Deposition CVD is a widely used process for producing thin solid films and,
nanoscale structures from gaseous reactants. Its applications range from coatings for wear …

The potential of an additional degree of freedom (DOF) in the effort to meet film or deposition
rate uniformity along the wafer in CVD processes is investigated. The investigation applies …