Towards modeling of ZrO2 atomic layer deposition at reactor scale based on experimental kinetic approximation
In this study, the growth kinetics of ZrO 2 via the atomic layer deposition (ALD) using a mixed
alkylamido-cyclopentadienyl zirconium precursor are proposed based on experimental data …
alkylamido-cyclopentadienyl zirconium precursor are proposed based on experimental data …
Thermal Decomposition In Situ Monitoring System of the Gas Phase Cyclopentadienyl Tris(dimethylamino) Zirconium (CpZr(NMe2)3) Based on FT-IR and QMS for …
JK An, E Choi, S Shim, H Kim, G Kang… - Nanoscale Research …, 2020 - Springer
We developed a newly designed system based on in situ monitoring with Fourier transform
infrared (FT-IR) spectroscopy and quadrupole mass spectrometry (QMS) for understanding …
infrared (FT-IR) spectroscopy and quadrupole mass spectrometry (QMS) for understanding …
[PDF][PDF] Coatings for ALD Reactors to Prevent Metal Contamination on Semiconductor Products
IM Tuoriniemi - 2019 - core.ac.uk
Demand for new, more powerful, highly functional yet smaller and portable microelectronic
devises appears to be never ending. The development of microelectronics industry has long …
devises appears to be never ending. The development of microelectronics industry has long …