Gd plasma source modeling at 6.7 nm for future lithography

B Li, P Dunne, T Higashiguchi, T Otsuka… - Applied Physics …, 2011 - pubs.aip.org
Plasmas containing gadolinium have been proposed as sources for next generation
lithography at 6. x nm. To determine the optimum plasma conditions, atomic structure …

Control of current and voltage oscillations in a short dc discharge making use of external auxiliary electrode

AS Mustafaev, VI Demidov, I Kaganovich… - Review of Scientific …, 2012 - pubs.aip.org
A dc discharge with a hot cathode is subject to current and voltage plasma oscillations,
which have deleterious effects on its operation. The oscillations can be inhibited by installing …

Suppression of Instabilities in a Plasma Voltage Stabilizer

A Mustafaev, A Grabovskiy, V Sukhomlinov - Applied Sciences, 2022 - mdpi.com
This article presents the results of experiments aimed at studying the conditions for the
excitation of current and voltage oscillations in plasma in a three-electrode voltage stabilizer …

A simplified MHD model of capillary Z‐pinch compared with experiments

AA Shapolov, M Kiss… - Contributions to Plasma …, 2016 - Wiley Online Library
The most accurate models of the capillary Z‐pinches used for excitation of soft X‐ray lasers
and photolithography XUV sources currently are based on the magnetohydrodynamics …

Note: Enhancement of the extreme ultraviolet emission from a potassium plasma by dual laser irradiation

T Higashiguchi, M Yamaguchi, T Otsuka… - Review of Scientific …, 2014 - pubs.aip.org
Emission spectra from multiply charged potassium ions ranging from K 3+ to K 5+ have been
obtained in the extreme ultraviolet (EUV) spectral region. A strong emission feature peaking …

アルカリ金属プラズマからの波長40nm 極端紫外放射特性

東口武史, 山口麻美, 大塚崇光, 寺内宏満… - … 学術講演会講演予稿集 …, 2011 - jstage.jst.go.jp
30p-B-7 Page 1 アルカリ金属プラズマからの波長 40 nm 極端紫外放射特性 Characteristics of
40-nm EUV emission from an alkali-metal plasma 宇都宮大院工,CORE 1,アイルランド国立大学 …