Imaging-based measurement methods of polarization aberration (PA) are indispensable in
hyper-numerical aperture projection optics for advanced lithography. However, the current …

Background: Critical design configurations, so-called hotspots, have limited lithography
process margins and are particularly sensitive to mask topography effects. Unfortunately …

With the continuous shrink of feature sizes, the 3D mask effects cannot be ignored in
computational lithography. 3D mask effects inducing focus shift and scalar aberration like …

Optical projection lithography is the predominant microlithography technique that is used in
the semiconductor fabrication process. It uses light to transfer the information from a …

With the increasing requirement of lithographic resolution, the degradation of 3D mask effect
on imaging cannot be ignored. The researches of its polarization properties and effect on …

Differential methods are shown to reveal inherent phase in light, corresponding to either the
structure of the scattering object, or to aberrations in the imaging medium. Intensity …

Pour les technologies avancées, la lithographie optique par immersion utilisant des sources
193nm atteint ses limites en termes de résolutions. Les nouvelles techniques de …