In this study, the influence of AlN barrier thickness (tb) on the RF & DC performances of 50 nm recessed T-gate Fe-doped AlN/GaN/SiC HEMT is investigated. The proposed HEMT …
K Harrouche, S Venkatachalam, L Ben-Hammou… - Micromachines, 2023 - mdpi.com
In this paper, we report on an enhancement of mm-wave power performances with a vertically scaled AlN/GaN heterostructure. An AlGaN back barrier is introduced underneath a …
Charge trapping effects represent a major challenge in the performance evaluation and the measurement-based compact modeling of modern short-gate-length (ie,≤ 0.15 μm) Gallium …
In this paper, we report DC and RF analysis of a T‐gate AlN/β‐Ga2O3 high electron mobility transistors (HEMTs) by optimizing the gate‐drain distance (L GD) and two T‐gate …
We present a novel and numerically efficient approach to analyse the sensitivity of AC parameters to variations of traps in GaN HEMTs. The approach exploits an in-house TCAD …
In this work, we present the novel application of SiNx stress-engineering techniques for the suppression of short-channel effects in AlGaN/GaN high-electron-mobility transistors …
Charge-trapping mechanisms observed in high-voltage GaN switches are responsible for the degradation of power converter efficiency due to modulation of the effective dynamic ON …
C Ramella, C Florian, MDR Garcìa… - IEEE Transactions …, 2024 - ieeexplore.ieee.org
This article presents the complete characterization of a-band monolithic (MMIC) high-power amplifier (HPA) developed with a commercial 100-nm gallium nitride (GaN)/Si process …
A comprehensive framework is proposed for the extraction of RF GaN HEMT trap-related parameters (gate/drain lag, thermal resistance, trap activation energy, cross-section, and …