Ferroelectric transistors for memory and neuromorphic device applications

IJ Kim, JS Lee - Advanced Materials, 2023 - Wiley Online Library
Ferroelectric materials have been intensively investigated for high‐performance nonvolatile
memory devices in the past decades, owing to their nonvolatile polarization characteristics …

Neuromorphic devices based on fluorite‐structured ferroelectrics

DH Lee, GH Park, SH Kim, JY Park, K Yang… - InfoMat, 2022 - Wiley Online Library
A continuous exponential rise has been observed in the storage and processing of the data
that may not curtail in the foreseeable future. The required data processing speed and …

A Perspective on ferroelectricity in hafnium oxide: Mechanisms and considerations regarding its stability and performance

JF Ihlefeld, ST Jaszewski, SS Fields - Applied Physics Letters, 2022 - pubs.aip.org
Ferroelectric hafnium oxides are poised to impact a wide range of microelectronic
applications owing to their superior thickness scaling of ferroelectric stability and …

Reliability of HfO2-Based Ferroelectric FETs: A Critical Review of Current and Future Challenges

N Zagni, FM Puglisi, P Pavan… - Proceedings of the …, 2023 - ieeexplore.ieee.org
Ferroelectric transistors (FeFETs) based on doped hafnium oxide (HfO2) have received
much attention due to their technological potential in terms of scalability, high-speed, and …

Review on the microstructure of ferroelectric hafnium oxides

M Lederer, D Lehninger, T Ali… - physica status solidi …, 2022 - Wiley Online Library
Ferroelectric hafnium oxide is of major interest for a multitude of applications in
microelectronics, ranging from neuromorphic devices to actuators and sensors. While the …

Comprehensive variability analysis in dual-port fefet for reliable multi-level-cell storage

S Chatterjee, S Thomann, K Ni… - … on Electron Devices, 2022 - ieeexplore.ieee.org
HfO 2-based FeFET is a remarkably promising candidate among emerging memory
technologies. Its manifold applications range from nonvolatile memory to neuromorphic …

Influence of annealing temperature on the structural and electrical properties of Si-doped ferroelectric hafnium oxide

M Lederer, P Bagul, D Lehninger… - ACS Applied …, 2021 - ACS Publications
The ferroelectric properties of hafnium oxide films are strongly influenced by the
crystallization process due to the interaction of thermodynamics, kinetics, and mechanical …

Ferroelectric field effect transistors (FeFETs): advancements, challenges and exciting prospects for next generation non-volatile memory (NVM) applications

J Ajayan, P Mohankumar, D Nirmal… - Materials Today …, 2023 - Elsevier
Data intensive applications such as AI (Artificial Intelligence) and IoT (Internet of Things)
demand high performance and highly reliable non-volatile memories (NVM). FeFET offers …

Low voltage and high speed 1Xnm 1T1C FE-RAM with ultra-thin 5nm HZO

M Sung, K Rho, J Kim, J Cheon, K Choi… - 2021 IEEE …, 2021 - ieeexplore.ieee.org
World-first 1Xnm half-pitch FE-RAM with 8Gb density was fabricated, and operation was
confirmed. The conventional FE-RAM maximizes 2Pr by adjusting the capacitor plate …

Polarization Pruning: Reliability Enhancement of Hafnia‐Based Ferroelectric Devices for Memory and Neuromorphic Computing

RH Koo, W Shin, J Kim, J Yim, J Ko, G Jung… - Advanced …, 2024 - Wiley Online Library
Ferroelectric (FE) materials are key to advancing electronic devices owing to their non‐
volatile properties, rapid state‐switching abilities, and low‐energy consumption. FE‐based …