A continuous exponential rise has been observed in the storage and processing of the data that may not curtail in the foreseeable future. The required data processing speed and …
Ferroelectric hafnium oxides are poised to impact a wide range of microelectronic applications owing to their superior thickness scaling of ferroelectric stability and …
Ferroelectric transistors (FeFETs) based on doped hafnium oxide (HfO2) have received much attention due to their technological potential in terms of scalability, high-speed, and …
Ferroelectric hafnium oxide is of major interest for a multitude of applications in microelectronics, ranging from neuromorphic devices to actuators and sensors. While the …
HfO 2-based FeFET is a remarkably promising candidate among emerging memory technologies. Its manifold applications range from nonvolatile memory to neuromorphic …
The ferroelectric properties of hafnium oxide films are strongly influenced by the crystallization process due to the interaction of thermodynamics, kinetics, and mechanical …
Data intensive applications such as AI (Artificial Intelligence) and IoT (Internet of Things) demand high performance and highly reliable non-volatile memories (NVM). FeFET offers …
M Sung, K Rho, J Kim, J Cheon, K Choi… - 2021 IEEE …, 2021 - ieeexplore.ieee.org
World-first 1Xnm half-pitch FE-RAM with 8Gb density was fabricated, and operation was confirmed. The conventional FE-RAM maximizes 2Pr by adjusting the capacitor plate …
Ferroelectric (FE) materials are key to advancing electronic devices owing to their non‐ volatile properties, rapid state‐switching abilities, and low‐energy consumption. FE‐based …