Reliable time exponents for long term prediction of negative bias temperature instability by extrapolation

R Gao, AB Manut, Z Ji, J Ma, M Duan… - … on Electron Devices, 2017 - ieeexplore.ieee.org
To predict the negative bias temperature instability (NBTI) toward the end of pMOSFETs' ten
years lifetime, power-law-based extrapolation is the industrial standard method. The …

Energy distribution of positive charges in gate dielectric: Probing technique and impacts of different defects

SWM Hatta, Z Ji, JF Zhang, M Duan… - … on Electron Devices, 2013 - ieeexplore.ieee.org
Positive charges (PCs) in gate dielectric shift the threshold voltage and cause a time-
dependent device variability. To assess their impact on circuits, it is useful to know their …

Insight into electron traps and their energy distribution under positive bias temperature stress and hot carrier aging

M Duan, JF Zhang, Z Ji, WD Zhang… - … on Electron Devices, 2016 - ieeexplore.ieee.org
The access transistor of SRAM can suffer both positive bias temperature instability (PBTI)
and hot carrier aging (HCA) during operation. The understanding of electron traps (ETs) is …

New analysis method for time-dependent device-to-device variation accounting for within-device fluctuation

M Duan, JF Zhang, Z Ji, WD Zhang… - IEEE transactions on …, 2013 - ieeexplore.ieee.org
Variability of nanometer-size devices is a major challenge for circuit design. Apart from the
as-fabricated variability, the postfabrication degradation introduces a time-dependent …

Negative bias temperature instability lifetime prediction: Problems and solutions

Z Ji, S Hatta, JF Zhang, JG Ma, W Zhang… - 2013 IEEE …, 2013 - ieeexplore.ieee.org
Lifetime of pMOSFETs is limited by NBTI. Conventional slow measurement overestimates
lifetime due to recovery. The fast techniques suppress recovery, but cannot give reliable …

Defect loss: A new concept for reliability of MOSFETs

M Duan, JF Zhang, Z Ji, W Zhang… - IEEE electron device …, 2012 - ieeexplore.ieee.org
Defect generation limits device lifetime and enhances its variability. Previous works mainly
addressed the generation kinetics and process. The current understanding is that the …

Development of a technique for characterizing bias temperature instability-induced device-to-device variation at SRAM-relevant conditions

M Duan, JF Zhang, Z Ji, WD Zhang… - … on Electron Devices, 2014 - ieeexplore.ieee.org
SRAM is vulnerable to device-to-device variation (DDV), since it uses minimum-sized
devices and requires device matching. In addition to the as-fabricated DDV at time-zero …

Key issues and techniques for characterizing time-dependent device-to-device variation of SRAM

M Duan, JF Zhang, Z Ji, JG Ma, W Zhang… - 2013 IEEE …, 2013 - ieeexplore.ieee.org
Discreteness of aging-induced charges causes a Time-dependent Device-to-Device
Variation (TDDV) and SRAM is vulnerable to it. This work analyses the shortcomings of …

NBTI degradation effect on advanced-process 45 nm high-k PMOSFETs with geometric and process variations

SFWM Hatta, N Soin, D Abd Hadi, JF Zhang - Microelectronics Reliability, 2010 - Elsevier
Negative bias temperature instability (NBTI) has become an important reliability concern for
nano-scaled complementary metal oxide (CMOS) devices. This paper presents the effect of …

Traps

JF Zhang - Wiley Encyclopedia of Electrical and Electronics …, 1999 - Wiley Online Library
Traps are the defects that can capture mobile charge carriers and this article focuses on the
traps in gate dielectrics prepared on Silicon substrate, which dominates the modern …