Physics, Structures, and Applications of Fluorite‐Structured Ferroelectric Tunnel Junctions

J Hwang, Y Goh, S Jeon - Small, 2024 - Wiley Online Library
The interest in ferroelectric tunnel junctions (FTJ) has been revitalized by the discovery of
ferroelectricity in fluorite‐structured oxides such as HfO2 and ZrO2. In terms of thickness …

Review on the microstructure of ferroelectric hafnium oxides

M Lederer, D Lehninger, T Ali… - physica status solidi …, 2022 - Wiley Online Library
Ferroelectric hafnium oxide is of major interest for a multitude of applications in
microelectronics, ranging from neuromorphic devices to actuators and sensors. While the …

Local Epitaxial Templating Effects in Ferroelectric and Antiferroelectric ZrO2

K Chae, SF Lombardo, N Tasneem… - … Applied Materials & …, 2022 - ACS Publications
Nanoscale polycrystalline thin-film heterostructures are central to microelectronics, for
example, metals used as interconnects and high-K oxides used in dynamic random-access …

Disturb-free operations of multilevel cell ferroelectric FETs for NAND applications

C Jin, J Xu, J Gu, J Zhao, X Jia, J Chen… - … on Electron Devices, 2023 - ieeexplore.ieee.org
We have experimentally investigated disturb-free operations of multilevel cell (MLC)
ferroelectric field-effect transistors (FeFETs) in a NAND array. The fabricated FeFET cells are …

Effect of Al2O3 interlayers on the microstructure and electrical response of ferroelectric doped HfO2 thin films

M Lederer, K Seidel, R Olivo, T Kämpfe… - Frontiers in …, 2022 - frontiersin.org
Novel devices based on ferroelectric hafnium oxide comply with the increasing demand for
highly scalable embedded non-volatile memory devices, especially for in-memory …

Giant energy storage and power density negative capacitance superlattices

SS Cheema, N Shanker, SL Hsu, J Schaadt, NM Ellis… - Nature, 2024 - nature.com
Dielectric electrostatic capacitors1, due to their ultrafast charge-discharge capability, are
attractive for high power energy storage applications. Along with ultrafast operation, on-chip …

Direct growth of ferroelectric orthorhombic ZrO 2 on Ru by atomic layer deposition at 300° C

M Ko, JS Park, S Joo, S Hong, JM Yuk, KM Kim - Materials Horizons, 2025 - pubs.rsc.org
Fluorite-structured binary oxide ferroelectrics exhibit robust ferroelectricity at a thickness
below 10 nm, making them highly scalable and applicable for high-end semiconductor …

3D Ferroelectric Phase Field Simulations of Polycrystalline Multi‐Phase Hafnia and Zirconia Based Ultra‐Thin Films

P Kumar, M Hoffmann, A Nonaka… - Advanced Electronic …, 2024 - Wiley Online Library
Abstract HfO2–and ZrO2–based ferroelectric thin films have emerged as promising
candidates for the gate oxides of next‐generation electronic devices. Recent work has …

Pyroelectric and ferroelectric properties of hafnium oxide doped with Si via plasma enhanced ald

M Neuber, MW Lederer, K Mertens, T Kämpfe… - Crystals, 2022 - mdpi.com
Devices based on ferroelectric hafnium oxide are of major interest for sensor and memory
applications. In particular, Si-doped hafnium oxide layers are investigated for the application …

Nanoscale Phase and Orientation Mapping in Multiphase Polycrystalline Hafnium Zirconium Oxide Thin Films Using 4D‐STEM and Automated Diffraction Indexing

G Baucom, E Hershkovitz, P Chojecki, T Nishida… - Small …, 2024 - Wiley Online Library
Ferroelectric hafnium zirconium oxide (HZO) holds promise for nextgeneration memory and
transistors due to its superior scalability and seamless integration with complementary metal …