The evolutionary advances in photosensitive material technology, together with the
shortening of the exposure wavelength in the photolithography process, have enabled and …

In this study, software and hardware that supported automatic optical inspection (AOI) for
printed circuit board production line was proposed and demonstrated. The proposed method …

The paper identifies the meso scale (10 µm to few millimeters) component size that can be
manufactured by using both lithography and non-lithography based approaches. Non …

Block copolymers (BCP) are highly promising self-assembling precursors for scalable
nanolithography. Very regular BCP nanopatterns can be used as on-chip etch masks. The …

In this study, a method that is able to estimate the electromagnetic characteristic of spiral
antennas was proposed and realized through consecutive procedures of automatic optical …

The heterogeneity of the chemical structure of photoresist polymers, both within and
between the polymer chains, is believed to contribute to the phenomenon of line edge …

This paper describes the fabrication of nanodimensioned silicon structures on silicon wafers
from thin films of a poly (styrene)‐block‐poly (dimethylsiloxane)(PS‐b‐PDMS) block …

This presentation reported an approach of glucose derivatives to resist polymers for eco-
friendly optical NEMS and MEMS. The material design concept to use the water-soluble …

We investigated the eco-friendly electron beam (EB) and extreme-ultraviolet (EUV)
lithography using a high-sensitive negative type of green resist material derived from …

This chapter highlights the recent developments in the use of DNA‐programmed self‐
assembly to guide the construction of discrete photonic nanostructures. It discusses the …