Low-temperature (<; 10 eV) plasmas with densities varying over a very wide range from 10
13 m-3 at the lower end to as high as 10 23 m-3 have firmly established themselves as one …

The dense plasma focus (DPF), a coaxial plasma gun, utilizes pulsed high current electrical
discharge to heat and compress the plasma to very high density and temperature with …

Tungsten nitride thin films were deposited on stainless steel–304 substrates by using a low
energy (2 kJ) Mather type plasma focus device. X-ray diffraction (XRD), scanning electron …

Synthesis of hydrocarbon-vanadium thin films by a low energy plasma focus device is
reported. The thin films have organometallic structure and organometallic trovacenyl …

In this paper, results of time-of-flight measurements of fast ion beam generated and
accelerated in the final pinch phase of a 2 kJ dense plasma focus device at 12 kV in Neon …

The pulsed intense ion beam, emitted from a dense plasma focus (DPF) discharges
performed with hydrogen gas, has been used to ablate the graphite target depositing …

Thin films of TiCx/SiC/aC: H were synthesized on Si substrates using a complex mix of high
energy density plasmas and instability accelerated energetic ions of filling gas species …

Using the first-principles density functional method, we investigate the band structures and
conductivity spectra for N-doped 3C-SiC. It is found that conductivity peaks of heavily N …

The electronic structures and optical properties of heavily boron (B)-doped zinc blende
silicon carbide (β-SiC) have been investigated using the plane-wave pseudo-potential …

A 3.3 kJ Mather type dense plasma focus device is used to generate a pulsed argon ion
beam of 100 KeV in this work. Hydrogenated amorphous silicon (a-Si: H) film prepared by …