Atomic layer deposition of metals: Precursors and film growth

DJ Hagen, ME Pemble, M Karppinen - Applied Physics Reviews, 2019 - pubs.aip.org
The coating of complex three-dimensional structures with ultrathin metal films is of great
interest for current technical applications, particularly in microelectronics, as well as for basic …

Precursors and chemistry for the atomic layer deposition of metallic first row transition metal films

TJ Knisley, LC Kalutarage, CH Winter - Coordination Chemistry Reviews, 2013 - Elsevier
Recent trends in the microelectronics industry are requiring the growth of metallic first row
transition metal films by the atomic layer deposition (ALD) method. The ALD growth of noble …

Amidinates, guanidinates and iminopyrrolidinates: Understanding precursor thermolysis to design a better ligand

ST Barry - Coordination Chemistry Reviews, 2013 - Elsevier
The thermolysis of metal compounds incorporating amidinate-type ligands (RN (H) C (X)
NR, where R is any alkyl and X is an alkyl or an amido) show a great complexity and …

Low-temperature atomic layer deposition of copper films using borane dimethylamine as the reducing co-reagent

LC Kalutarage, SB Clendenning… - Chemistry of …, 2014 - ACS Publications
The atomic layer deposition (ALD) of Cu metal films was carried out by a two-step process
with Cu (OCHMeCH2NMe2) 2 and BH3 (NHMe2) on Ru substrates and by a three-step …

Thermal Stability and Decomposition Pathways in Volatile Molybdenum (VI) Bis-Imides

MA Land, G Bacic, KN Robertson, ST Barry - Inorganic Chemistry, 2022 - ACS Publications
The vapor deposition of many molybdenum-containing films relies on the delivery of volatile
compounds with the general bis (tert-butylimido) molybdenum (VI) framework, both in atomic …

Origin of Decomposition in a Family of Molybdenum Precursor Compounds

MA Land, G Bacic, KN Robertson, ST Barry - Inorganic Chemistry, 2022 - ACS Publications
The bis (tert-butylimido)-molybdenum (VI) framework has been used successfully in the
design of vapor-phase precursors for molybdenum-containing thin films, so understanding …

Surface chemistry of copper metal and copper oxide atomic layer deposition from copper (ii) acetylacetonate: a combined first-principles and reactive molecular …

X Hu, J Schuster, SE Schulz, T Gessner - Physical Chemistry Chemical …, 2015 - pubs.rsc.org
Atomistic mechanisms for the atomic layer deposition using the Cu (acac) 2 (acac=
acetylacetonate) precursor are studied using first-principles calculations and reactive …

Ligand-Assisted Volatilization and Thermal Stability of Bis(imido)dichloromolybdenum(VI) ([(t-BuN═)2MoCl2]2) and Its Adducts

MA Land, KN Robertson, ST Barry - Organometallics, 2019 - ACS Publications
Volatile molybdenum-containing compounds have successfully been utilized for the atomic
layer deposition of MoN x, MoO3, MoS2, and MoC x N y. Most of the reported volatile …

Designing Stability into Thermally Reactive Plumbylenes

G Bacic, D Zanders, B Mallick, A Devi… - Inorganic …, 2018 - ACS Publications
Lead analogues of N-heterocyclic carbenes (NHPbs) are the least understood members of
this increasingly important class of compounds. Here we report the design, preparation …

Investigation of the chemical vapor deposition of Cu from copper amidinate through data driven efficient CFD modelling

R Spencer, P Gkinis, ED Koronaki… - Computers & Chemical …, 2021 - Elsevier
A chemical reaction model, consisting of two gas-phase and a surface reaction, for the
deposition of copper from copper amidinate is investigated, by comparing results of an …