The transparency of oxide semiconductors is a significant feature that enables the fabrication of fully transparent electronics. Unfortunately, practical transparent electronics …
H Kim, S Maeng, S Lee, J Kim - ACS Applied Electronic Materials, 2021 - ACS Publications
Solution-processed indium gallium tin oxide (InGaSnO, IGTO) thin film transistors (TFTs) are investigated as promising low-cost and stable materials for high-performance amorphous …
D Koretomo, S Hamada, Y Magari, M Furuta - Materials, 2020 - mdpi.com
Electrical and carrier transport properties in In–Ga–Zn–O thin-film transistors (IGZO TFTs) with a heterojunction channel were investigated. For the heterojunction IGZO channel, a …
K Ide, K Ishikawa, H Tang, T Katase… - … status solidi (a), 2019 - Wiley Online Library
It is generally thought that deposition of device‐quality oxide semiconductors requires somewhat high oxygen supply in order to reduce oxygen deficiency and to suppress …
KA Stewart, V Gouliouk, DA Keszler, JF Wager - Solid-State Electronics, 2017 - Elsevier
Boron indium oxide (BIO) is studied for thin-film transistor (TFT) channel layer applications. Sputtered BIO thin films exhibit an amorphous phase over a wide range of B 2 O 3/In 2 O 3 …
Energy level matching is a key factor for realizing efficient optoelectronics, such as organic light‐emitting diodes (OLEDs). Transition metal oxides (TMOs) are widely used as hole …
H Guendouz, A Bouaine, N Brihi - Journal of Non-Crystalline Solids, 2021 - Elsevier
Abstract Transparent amorphous Sn–Al co-doped ZnO thin films (a-SAZO) were prepared by sol-gel spin-coating technique. Sn was inserted with a constant concentration of 2 at.%, and …
A Kruv, MJ Van Setten, HFW Dekkers… - … on Electron Devices, 2023 - ieeexplore.ieee.org
The main limitations of the current dynamic random access memory (DRAM) technology are its scalability and power consumption. These constraints can be overcome by using an In …