[图书][B] Nanowire transistors: physics of devices and materials in one dimension

JP Colinge, J Greer - 2016 - books.google.com
From quantum mechanical concepts to practical circuit applications, this book presents a self-
contained and up-to-date account of the physics and technology of nanowire semiconductor …

Nanowire transistors: a next step for the low-power digital technology

D Ajitha, K Vijaya Lakshmi… - IETE Journal of …, 2023 - Taylor & Francis
As conventional Complementary Metal Oxide Semiconductor (CMOS) reaches extreme
limitation to implement the digital circuits with high density and low power dissipation …

Novel Design Methodology Using Sizing in Nanowire CMOS Logic

G Kaushal, SK Manhas… - IEEE Transactions …, 2014 - ieeexplore.ieee.org
In this paper, the impact of nanowire source/drain extension, diameter, and channel length
on nanowire (NW) device performance is investigated. We present a novel approach using …

3D transistors

JP Colinge - … Symposium on VLSI Technology, Systems and …, 2013 - ieeexplore.ieee.org
After having been considered “exotic devices”, multigate 3D transistor such as FinFETs,
trigate FETs or Gate-all-Around nanowire FETs have become an industrial reality. The …

Gate-all-around silicon nanowire transistor technology

R Huang, R Wang, M Li - Women in Microelectronics, 2020 - Springer
As a promising alternative to the fundamental device structure, the gate-all-around silicon
nanowire transistor (GAA SNWT) has been studied extensively for decades. In this chapter …

Prospective for nanowire transistors

JP Colinge, SH Dhong - Proceedings of the IEEE 2013 Custom …, 2013 - ieeexplore.ieee.org
The multigate nanowire FET architecture allows for ultimate short-channel control and push
Moore's law down to sub-5nm gate lengths. This paper reviews nanowire transistor device …

Variability and reliability analysis of carbon nanotube technology in the presence of manufacturing imperfections

C García Almudéver - 2014 - upcommons.upc.edu
In 1925, Lilienfeld patented the basic principle of field effect transistor (FET). Thirty-four
years later, Kahng and Atalla invented the MOSFET. Since that time, it has become the most …

[PDF][PDF] Integration von Multi-Gate-Transistoren auf Basis einer 22 nm-Technologie

T Baldauf - 2014 - core.ac.uk
Die kontinuierliche Skalierung der planaren MOSFETs war in den vergangenen 40 Jahren
der Schlüssel, um die Bauelemente immer kleiner und leistungsfähiger zu gestalten. Hinzu …

Impact of channel and spacer engineering on DC and RF performance of Gate-all-around FET

Z Zhou, YB Sun, XJ Li, YL Shi, SM Chen… - 2018 14th IEEE …, 2018 - ieeexplore.ieee.org
In this paper, the insight to the impact of channel and spacer design on DC and RF
performance of GAAFET is carried out. The channel design includes the optimization of …

[引用][C] 后摩尔时代大规模集成电路器件与集成技术

黎明, 黄如 - 中国科学: 信息科学, 2018