High-power impulse magnetron sputtering is a deposition technique where a metal
magnetron target is sputtered in a high-density plasma to synthesise thin layers with …

Spokes are long wavelength oscillations observed in the magnetized region of direct current
magnetron sputtering (DCMS), high power impulse magnetron sputtering (HiPIMS), as well …

The ionization of sputtered species in high power impulse magnetron sputtering of titanium,
chromium, and aluminum targets is analyzed using Abel-inverted spectroscopic imaging to …

We apply the ionization region model (IRM) and the Orsay Boltzmann equation for electrons
coupled with ionization and excited states kinetics (OBELIX) model to study the electron …

In high power impulse magnetron sputtering (HiPIMS) bright plasma spots are observed
during the discharge pulses that rotate with velocities in the order of 10 km s− 1 in front of the …

Using a triple probe situated above the racetrack and inside the magnetic trap of a
magnetron, rotating spoke-like structures have been clearly identified in a single HiPIMS …

In this paper, the novel technique of THz time domain spectroscopy has been applied to
obtain time-resolved measurements of the plasma density in the active zone of a HiPIMS …

High power impulse magnetron sputtering (HiPIMS) is a versatile technology to deposit thin
films with superior properties. During HiPIMS, the power is applied in short pulses of the …

We present a three-dimensional particle-based computer simulation of high-power impulse
magnetron sputtering (HiPIMS) discharges which enables us to simulate the transport of …

Direct current magnetron sputtering of Al by Ar and Ar/N 2 low pressure plasmas was
characterized by experimental and theoretical means in a unified consideration …