Materials modification by electronic excitation

N Itoh, AM Stoneham - Radiation effects and defects in solids, 2001 - Taylor & Francis
Excitonic mechanisms of defect formation and of sputtering from surfaces, induced as a
consequence of exciton relaxation, are effective in a limited class of wide-gap materials …

Recombination at textured silicon surfaces passivated with silicon dioxide

KR McIntosh, LP Johnson - Journal of applied physics, 2009 - pubs.aip.org
The surfaces of solar cells are often textured to increase their capacity to absorb light. This
optical benefit is partially offset, however, by an increase in carrier recombination at or near …

Surface passivation schemes for high-efficiency c-Si solar cells-A review

N Balaji, SQ Hussain, C Park, J Raja, J Yi… - … on Electrical and …, 2015 - koreascience.kr
To reduce the cost of solar electricity, the crystalline-silicon (c-Si) photovoltaic industry is
moving toward the use of thinner wafers (100 μm to 200 μm) to achieve a high efficiency. In …

Simultaneous field emission and photoemission from diamond

C Bandis, BB Pate - Applied physics letters, 1996 - pubs.aip.org
The electron field emission properties of the (111) 1× 1: H surface of natural semiconducting
(p‐type) diamond have been examined with simultaneous field emission and photoemission …

Energy-band parameters of atomic layer deposited Al2O3 and HfO2 on InxGa1− xAs

ML Huang, YC Chang, YH Chang, TD Lin… - Applied Physics …, 2009 - pubs.aip.org
X-ray photoelectron spectroscopy (XPS) combined with reflection electron energy loss
spectroscopy (REELS) were used to determine the energy-band parameters, valence-band …

Nanometer scale lithography at high scanning speeds with the atomic force microscope using spin on glass

SW Park, HT Soh, CF Quate, SI Park - Applied Physics Letters, 1995 - pubs.aip.org
We have identified a resist material that is suitable for high‐speed, nanometer‐scale
scanning probe lithography (SPL) using the atomic force microscope (AFM). The material is …

Inversion-channel GaN metal-oxide-semiconductor field-effect transistor with atomic-layer-deposited Al2O3 as gate dielectric

YC Chang, WH Chang, HC Chiu, LT Tung… - Applied Physics …, 2008 - pubs.aip.org
Inversion n-channel GaN metal-oxide-semiconductor field-effect-transistors (MOSFETs)
using atomic-layer-deposited Al 2 O 3 as a gate dielectric have been fabricated, showing …

Quantitative two‐dimensional dopant profile measurement and inverse modeling by scanning capacitance microscopy

Y Huang, CC Williams, J Slinkman - Applied physics letters, 1995 - pubs.aip.org
Quantitative dopant profile measurements are performed on a nanometer scale by scanning
capacitance microscopy (SCM). An atomic force microscope is used to position a nanometer …

How multi-threshold designs can protect analog IPs

A Ash-Saki, S Ghosh - 2018 IEEE 36th International …, 2018 - ieeexplore.ieee.org
Analog Integrated Circuits (ICs) are one of the top targets for counterfeiting. However, the
security of analog Intellectual Property (IP) is not well investigated as its digital counterpart …

High-performance surface channel In-rich In0.75Ga0.25As MOSFETs with ALD high-k as gate dielectric

Y Xuan, T Shen, M Xu, YQ Wu… - 2008 IEEE International …, 2008 - ieeexplore.ieee.org
High-performance inversion-type enhancement-mode n-channel MOSFETs on In-rich In
0.75 Ga 0.25 As using ALD Al 2 O 3 as high-k gate dielectrics are demonstrated. The …