A comprehensive review on FinFET in terms of its device structure and performance matrices

MN Reddy, DK Panda - Silicon, 2022 - Springer
The revolutions made in the CMOS technology are brought up by, continuous downscaling
in order to obtain higher density, better performance and low power consumption, causing …

Strategic review on different materials for FinFET structure performance optimization

KB Madhavi, SL Tripathi - IOP Conference Series: Materials …, 2020 - iopscience.iop.org
In this paper, the strategic review of different materials that are used in FinFET structure is
studied. This is achieved by using carefully designed source/drain spacers and doped …

Robustness evaluation of electrical characteristics of sub-22 nm FinFETs affected by physical variability

BM Kalasapati, SL Tripathi - Materials Today: Proceedings, 2022 - Elsevier
The physical parameters of digital devices have been affected by process variability The
paper is focused on subthreshold performance characterization of FET with Visual TCAD …

Comparative study on random interface traps-induced reliability of NC-FinFETs and FinFETs

W Lü, C Zhang, D Chen, Y Han, W Wei - Silicon, 2023 - Springer
Fin-type field-effect transistors (FinFETs) are vulnerable to the random interface trap (RIT)-
induced reliability issue caused by the bias temperature instability and hot carrier injection …

Analysis on the impact of interface Trap distributions on SOI DMG FinFETs: Overlap/underlap configurations

R Chaudhary, R Saha - Micro and Nanostructures, 2024 - Elsevier
This paper investigates the significance of interface trap charges (ITCs) distribution by
introducing localized charges (donor/acceptor) at the interface of semiconductor/insulator on …

Physical insights of interface traps and self-heating effect on electrical response of DMG FinFETs in overlap and underlap configurations: analog/RF perspective

R Chaudhary, R Saha - Physica Scripta, 2023 - iopscience.iop.org
This paper presents a thorough analysis on analog/RF parameters including interface trap
charges (ITCs) of two different densities of states (DOS) along with self-heating on the …

Impact of interface trap charge on analog/rf parameters of novel heterogeneous gate dielectric tri-metal gate finfet

S Saraswat, DS Yadav - 2021 International Conference on …, 2021 - ieeexplore.ieee.org
In this script, an innovative structure is introduced to optimize TMG FinFET by employing
dielectric material engineering. In this method, HfO 2 is placed towards the source side, with …

Analytical modeling of random discrete traps induced threshold voltage fluctuations in double-gate MOSFET with HfO2/SiO2 gate dielectric stack

SR Sriram, B Bindu - Microelectronics Reliability, 2019 - Elsevier
An analytical model of threshold voltage fluctuations due to random discrete traps at Si/SiO 2
interface and in gate oxide regions for undoped double-gate (DG) MOSFET with high-k/SiO …