Zinc oxide (ZnO) nanorods have been extensively investigated, owing to their extraordinary
applications in numerous fields, spatially microchip technology, solar cells, sensors …

Thin film materials have been used in semiconductor devices, wireless communications,
telecommunications, integrated circuits, rectifiers, transistors, solar cells, lightemitting …

Atomic layer deposition (ALD) technology is one of the cornerstones of the modern
microelectronics industry, where it is exploited in the fabrication of high‐quality inorganic …

In this study, FeOx and CoOx thin films were successively and uniformly coated on high-
surface-area carbon nanotubes by plasma-enhanced atomic layer deposition, which formed …

Thin film encapsulation (TFE) is one of the key problems that hinders the lifetime and
widespread commercialization of flexible organic light-emitting diodes (OLEDs). In this work …

Water pollution still poses significant threats to the ecosystem and human health today. The
adsorption, advanced oxidation and membranes filtration have been extensively …

Abstract Atomic Layer Deposition (ALD) is employed for the growth of nanometric conformal
layers on distinct substrates. In the present work, we demonstrated the attainable …

Abstract Aluminum oxide (Al2O3) has revealed many applications in diverse areas from
optoelectronic devices to passivation according to its some physical, chemical, and …

Al 2 O 3/ZnO nanolaminates are promising nanocomposites with special properties for the
applications of oxide-based thin-film transistors, photoluminescence devices, and pitch …

Atomic layer deposition with O 3 reactant is widely used to deposit thin and conformal films
in a ZrO 2 based metal-insulator-metal (MIM) capacitor. Post-deposition annealing (PDA) …