Physical and chemical mechanisms in oxide-based resistance random access memory

KC Chang, TC Chang, TM Tsai, R Zhang… - Nanoscale research …, 2015 - Springer
In this review, we provide an overview of our work in resistive switching mechanisms on
oxide-based resistance random access memory (RRAM) devices. Based on the …

Multilevel switching memristor by compliance current adjustment for off-chip training of neuromorphic system

TH Kim, S Kim, K Hong, J Park, Y Hwang… - Chaos, Solitons & …, 2021 - Elsevier
Multilevel operation is one of the most essential properties for synaptic devices to realize
hardware artificial neural networks. Compliance current (I cc) adjustment is a multilevel …

Towards a better understanding of the forming and resistive switching behavior of Ti-doped HfO x RRAM

FF Athena, MP West, J Hah, R Hanus… - Journal of Materials …, 2022 - pubs.rsc.org
HfOx-Based resistive random-access memory (RRAM) devices are being widely considered
as both non-volatile memories for digital computation and synaptic memory for …

Filamentary TaOx/HfO2 ReRAM Devices for Neural Networks Training with Analog In‐Memory Computing

T Stecconi, R Guido, L Berchialla… - Advanced electronic …, 2022 - Wiley Online Library
The in‐memory computing paradigm aims at overcoming the intrinsic inefficiencies of Von‐
Neumann computers by reducing the data‐transport per arithmetic operation. Crossbar …

Synaptic Characteristics and Vector‐Matrix Multiplication Operation in Highly Uniform and Cost‐Effective Four‐Layer Vertical RRAM Array

J Kim, S Lee, S Kim, S Yang, JK Lee… - Advanced Functional …, 2024 - Wiley Online Library
This study implements a highly uniform 3D vertically stack resistive random‐access memory
(VRRAM) with a four‐layer contact hole structure. The fabrication process of a four‐layer …

Comparative analysis of low-frequency noise based resistive switching phenomenon for filamentary and interfacial RRAM devices

JK Lee, S Kim - Chaos, Solitons & Fractals, 2023 - Elsevier
We investigate the low-frequency noise (LFN) characteristics of resistive switching random
access memory (RRAM) devices with metal–insulator–metal structures of TiN/Ti/TiO 2/TiN …

Uniform resistive switching and highly stable synaptic characteristics of HfOx sandwiched TaOx-based memristor for neuromorphic system

SK Mohanty, D Panda, KPK Reddy, PT Lee, CH Wu… - Ceramics …, 2023 - Elsevier
Emerging nanoscale devices, including memristors, have been extensively studied to
implement biological synaptic functions such as learning and plasticity, which are the …

Resistive switching performance improvement of InGaZnO-based memory device by nitrogen plasma treatment

L Zhang, Z Xu, J Han, L Liu, C Ye, Y Zhou… - Journal of Materials …, 2020 - Elsevier
With the demand of flat panel display development, utilizing the non-volatile memory
devices based on indium-gallium-zinc-oxide (IGZO) film may be integrated with IGZO thin …

The role of Ti buffer layer thickness on the resistive switching properties of hafnium oxide-based resistive switching memories

SZ Rahaman, YD Lin, HY Lee, YS Chen, PS Chen… - Langmuir, 2017 - ACS Publications
Ti/HfO x-based resistive random access memory (RRAM) has been extensively investigated
as an emerging nonvolatile memory (NVM) candidate due to its excellent memory …

[HTML][HTML] Thermal environment impact on HfOx RRAM operation: A nanoscale thermometry and modeling study

MP West, G Pavlidis, RH Montgomery… - Journal of Applied …, 2023 - pubs.aip.org
As the demand for computing applications capable of processing large datasets increases,
there is a growing need for new in-memory computing technologies. Oxide-based resistive …