Low-stress stencil masks using SOI substrates for EPL and LEEPL
H Eguchi, T Kurosu, T Yoshii… - … Mask Technology X, 2003 - spiedigitallibrary.org
We focus on stencil mask technologies for the next generation lithography (NGL) options
such as electron projection lithography (EPL) and low energy electron-beam proximity …
such as electron projection lithography (EPL) and low energy electron-beam proximity …
Preliminary results of EB stepper in the application of 65-nm process
H Takenaka, K Koike, T Tsuchida… - Emerging …, 2004 - spiedigitallibrary.org
Electron projection lithography (EPL) is a promising candidate for next-generation
lithography (NGL) at the 65 nm technology node and beyond. Nikon has developed the …
lithography (NGL) at the 65 nm technology node and beyond. Nikon has developed the …
Mask distortion issues for next-generation lithography
PL Reu, RL Engelstad, EG Lovell - Microelectronic engineering, 2003 - Elsevier
Identifying mask distortion issues of next-generation lithography (NGL) technologies are
critical to the timely development of a successor to optical lithography at the sub-65 nm …
critical to the timely development of a successor to optical lithography at the sub-65 nm …
Low-stress stencil masks using a doping method
H Eguchi, T Kurosu, T Yoshii… - 23rd Annual …, 2003 - spiedigitallibrary.org
Membrane stress control is one of the challenges for the commercial success of the stencil
masks, such as electron projection lithography (EPL) and low energy electron-beam …
masks, such as electron projection lithography (EPL) and low energy electron-beam …
Subfield distortion of an EPL stencil mask
H Takenaka, H Yamashita, K Koike… - Emerging Lithographic …, 2003 - spiedigitallibrary.org
EPL (Electron Projection Lithography) is one of viable candidates for the NGL (Next
Generation Lithography) used for the 65nm technology node and below. EPL uses the …
Generation Lithography) used for the 65nm technology node and below. EPL uses the …
Reduction of image placement errors in EPL masks
OR Wood II, PL Reu, RL Engelstad… - Emerging …, 2003 - spiedigitallibrary.org
Minimizing mask-level distortions is critical to ensuring the success of electron projection
lithography (EPL) in the sub-65-nm regime. Previous research has demonstrated the …
lithography (EPL) in the sub-65-nm regime. Previous research has demonstrated the …
200-mm EPL stencil mask fabrication and metrology at DNP: IP and CD accuracy within subfield
T Takikawa, M Ishikawa, S Yusa… - Emerging …, 2004 - spiedigitallibrary.org
Electron beam projection lithography (EPL) has been developed for application to 65 nm
node devices and beyond. 200-mm EPL masks have also been developed keeping pace …
node devices and beyond. 200-mm EPL masks have also been developed keeping pace …
Image placement distortions in EPL masks
CW Thiel, L Kindt, M Lawliss - 22nd Annual BACUS …, 2002 - spiedigitallibrary.org
Electron projection lithography (EPL) is a promising candidate for the next generation
lithography choice. There are several advantages to EPL, such as a large depth of focus and …
lithography choice. There are several advantages to EPL, such as a large depth of focus and …
Bibliography (1994–2004) of other topics
J Mackerle - Modelling and Simulation in Materials Science and …, 2005 - iopscience.iop.org
Bibliography (1994–2004) of other topics - IOPscience This site uses cookies. By continuing
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