Review of technology for normally-off HEMTs with p-GaN gate

G Greco, F Iucolano, F Roccaforte - Materials Science in Semiconductor …, 2018 - Elsevier
Owing to the high carrier density and high electron mobility of the two dimensional electron
gas (2DEG), high electron mobility transistors (HEMTs) based on gallium nitride (GaN) are …

Fabrication and characterization of low defect density GaN using facet-controlled epitaxial lateral overgrowth (FACELO)

K Hiramatsu, K Nishiyama, M Onishi, H Mizutani… - Journal of Crystal …, 2000 - Elsevier
Facet structures of GaN grown by epitaxial lateral overgrowth (ELO) via low-pressure
metalorganic vapor-phase epitaxy (LP-MOVPE) are controlled by growth conditions such as …

Overcoming the fundamental light-extraction efficiency limitations of deep ultraviolet light-emitting diodes by utilizing transverse-magnetic-dominant emission

DY Kim, JH Park, JW Lee, S Hwang, SJ Oh… - Light: Science & …, 2015 - nature.com
While the demand for deep ultraviolet (DUV) light sources is rapidly growing, the efficiency
of current AlGaN-based DUV light-emitting diodes (LEDs) remains very low due to their …

Selective-area growth of thin GaN nanowires by MOCVD

K Choi, M Arita, Y Arakawa - Journal of Crystal Growth, 2012 - Elsevier
We report the selective-area growth (SAG) of Ga-polar thin GaN nanowires on patterned
GaN/sapphire (0001) substrates using metalorganic chemical vapor deposition (MOCVD) …

Heteroepitaxy of ε-Ga2O3 thin films grown on AlN/Si (1 1 1) templates by metal–organic chemical vapor deposition

W Chen, Z Chen, Z Li, Z Fei, Y Pei, G Wang… - Applied Surface Science, 2022 - Elsevier
High quality ε-phase gallium oxide (Ga 2 O 3) thin films grown on Si (1 1 1) substrates by
metal–organic chemical vapor deposition (MOCVD) have been demonstrated. It is found that …

Epitaxial lateral overgrowth techniques used in group III nitride epitaxy

K Hiramatsu - Journal of Physics: Condensed Matter, 2001 - iopscience.iop.org
Selective-area growth (SAG) and epitaxial lateral overgrowth (ELO) techniques used in
group III nitride epitaxy are reviewed. Structurally controlled GaN in line patterns and dot …

Polar-surface-dominated zigzag GaN nanowires with alternate H2 and O2 evolution sites for photocatalytic overall water splitting

H Pang, W Zhou, H Hu, L Liu, J Ye, D Wang - Applied Catalysis A: General, 2023 - Elsevier
Photocatalytic overall water splitting is an ideal green technology to produce the clean and
renewable hydrogen energy. Herein, high crystalline zigzag GaN nanowires (NWs) are …

Theoretical prediction of GaN nanostructure equilibrium and nonequilibrium shapes

V Jindal, F Shahedipour-Sandvik - Journal of Applied Physics, 2009 - pubs.aip.org
A wide variety of nanostructure shapes have been observed for GaN under different growth
conditions. These shapes include but are not limited to hexagonal pyramid, prismatic …

GaN HEMT for High-performance Applications: A Revolutionary Technology

G Pattnaik, M Mohapatra - Recent Advances in Electrical & …, 2024 - benthamdirect.com
Background: The upsurge in the field of radio frequency power electronics has led to the
involvement of wide bandgap semiconductor materials because of their potential …

Investigations of GaN growth on the sapphire substrate by MOCVD method with different AlN buffer deposition temperatures

WC Huang, CM Chu, YY Wong, KW Chen… - Materials Science in …, 2016 - Elsevier
The effects of different AlN buffer deposition temperatures on the GaN material properties
grown on sapphire substrate was investigated. At relatively higher AlN buffer growth …