This article provides a brief overview of both established and novel ellipsometry techniques,
as well as their applications. Ellipsometry is an indirect optical technique, in that information …

The main object of this chapter is to give an overview the possibilities offered by instruments
capable of measuring full Mueller matrices in the field of optical characterization. We have …

Optical scatterometry is the state of art optical inspection technique for quality control in
lithographic process. As such, any boost in its performance carries very relevant potential in …

We present a novel optical technique that produces nanometer dimensional measurement
sensitivity using a conventional bright-field optical microscope, by analyzing through-focus …

Recently, there has been significant research investigating new optical technologies for
dimensional metrology of features 22 nm in critical dimension and smaller. When modeling …

Parameter reconstruction is a common problem in optical nano metrology. It generally
involves a set of measurements, to which one attempts to fit a numerical model of the …

This paper compares and contrasts different combinations of scatterfield and scatterometry
optical configurations as well as introduces a new approach to embedding atomic force …

Abstract Angle-Resolved Scatterometry (ARS) enables the acquisition of images at the back
focal plane (BFP) of the objective lens. These images contain target geometry information …

An angle-resolved scatterfield microscope (ARSM) featuring 193 nm excimer laser light was
developed for measuring critical dimension (CD) and overlay of nanoscale targets as used …

Non-interferometric phase retrieval from the intensity measurements in Coherent Fourier
Scatterometry (CFS) is presented using a scanning focused spot. Formulae to determine the …