Review of overlay error and controlling methods in alignment system for advanced lithography
H Jin, Y Qi - … Conference on Information Optics and Photonics …, 2022 - spiedigitallibrary.org
Acting as one of the three critical indicators to evaluate the performance of lithography
scanners, overlay has been a vital factor which seriously affects the electric property, life …
scanners, overlay has been a vital factor which seriously affects the electric property, life …
Analysis of diffraction-based wafer alignment rejection for thick aluminum process
L Li, C Chen, H Zeng, S Hu, L Zhang, Y Su… - Journal of Vacuum …, 2022 - pubs.aip.org
A diffraction-based alignment method has been widely used during lithography processes.
The alignment position is obtained by analyzing the light intensity changes of the moiré …
The alignment position is obtained by analyzing the light intensity changes of the moiré …