A review on microelectrode array fabrication techniques and their applications
A Tanwar, HA Gandhi, D Kushwaha… - Materials Today …, 2022 - Elsevier
Biosensors are an important tool for the detection and quantitative analysis of biomolecules
and chemical compounds. There are a number of biosensors available based on the …
and chemical compounds. There are a number of biosensors available based on the …
Enhanced Solubility of Zirconium Oxo Clusters from Diacetoxyzirconium (IV) Oxide Aqueous Solution as Inorganic Extreme‐Ultraviolet Photoresists
S Kataoka, K Sue - European Journal of Inorganic Chemistry, 2022 - Wiley Online Library
Metal oxo clusters have drawn a great deal of attention as the extreme‐ultraviolet (EUV)
photoresists. However, industrial implementation in the next‐generation lithography …
photoresists. However, industrial implementation in the next‐generation lithography …
[HTML][HTML] Lithographic resists as amazing compact imaging systems–A review
U Okoroanyanwu - Micro and Nano Engineering, 2024 - Elsevier
Considering the goal of lithography under its most general aspect–that is, transferring and
recording mask or template information in the form of contrast between the imaged and non …
recording mask or template information in the form of contrast between the imaged and non …
Macrocycle network-aided nanopatterning of inorganic resists on silicon
S Nandi, L Khillare, MG Moinuddin… - ACS Applied Nano …, 2022 - ACS Publications
Inorganic resists have emerged as promising candidates in semiconductor industries to
realize sub-10 nm node technology. However, controlling vertical shrinkage of resist films …
realize sub-10 nm node technology. However, controlling vertical shrinkage of resist films …
Structural investigation of zinc‐based photoresists with different substituents for high‐resolution lithography
The fineness of the photolithographic pattern depends largely on the composition and
structure of the photoresist, and different structures endow metal‐based photoresists with …
structure of the photoresist, and different structures endow metal‐based photoresists with …
Chemical mechanisms of metal-based extreme ultraviolet resists
AM Brouwer - Journal of Photopolymer Science and Technology, 2022 - jstage.jst.go.jp
抄録 Hybrid organic/inorganic materials are considered as the Extreme Ultraviolet
photoresists of the future. Compared to chemically amplified polymer-based photoresists …
photoresists of the future. Compared to chemically amplified polymer-based photoresists …
Quantum dot encoder via near-field direct writing
H Wang, W Ou, Z Wu, N Cai, M Liu, J Liang… - IEEE Sensors …, 2022 - ieeexplore.ieee.org
Grating lithography has been successfully employed to fabricate the gratings of optical
encoders, which is increasingly unsuitable for the fast and mass production of optical …
encoders, which is increasingly unsuitable for the fast and mass production of optical …
[HTML][HTML] Wafer-level flexible carbon-based film for fluorescent display and optical information storage
S Zhang, K Bi, L Hou, M Guo, Y Zhuang, S Zhang, Q Li… - Materials & Design, 2024 - Elsevier
Fluorescent materials have garnered significant interest in optical display and information
storage fields for their vibrant and distinct color presentation. Extensive research has been …
storage fields for their vibrant and distinct color presentation. Extensive research has been …
Metal-based extreme ultraviolet photoresist
H CHEN, P CHEN, X PENG - CIESC Journal, 2022 - hgxb.cip.com.cn
Due to advantages of short exposure wavelength (13.5 nm) and high patterning resolution,
extreme ultraviolet (EUV) lithography is the state-of-the-art technology to break through the 3 …
extreme ultraviolet (EUV) lithography is the state-of-the-art technology to break through the 3 …