Ion beam modification of two-dimensional materials: Characterization, properties, and applications

Z Li, F Chen - Applied Physics Reviews, 2017 - pubs.aip.org
The layered two-dimensional (2D) materials, eg, the well-known graphene, transition metal
dichalcogenides, and topological insulators, have attracted great interest of researchers …

The study of influence of the gas flow rate to etched layer thickness, and roughness of the anisotropy field of gallium arsenide is etched in the plasma chemical etching …

OA Ageev, VS Klimin, MS Solodovnik… - Journal of Physics …, 2016 - iopscience.iop.org
In the experiments on the etched surface of gallium arsenide were performed. We studied
the effect of BCl 3 gas flow rate on the thickness of the etched layer. GaAs etching rate was …

The influence of the chemical and physical component of the plasma etching of the surface of gallium arsenide on the etching rate in the chloride plasma of the …

VS Klimin, RV Tominov, AV Eskov… - Journal of Physics …, 2017 - iopscience.iop.org
In this paper, experimental studies were carried out on the formation of a microrelief on the
surface of gallium arsenide substrates. The surface was modified by the method of plasma …

Formation of nanoscale structures on the surface of gallium arsenide by local anodic oxidation and plasma chemical etching

VS Klimin, MS Solodovnik, SA Lisitsyn… - Journal of Physics …, 2018 - iopscience.iop.org
This work is devoted to the analysis of problems of the present methods of surface treatment
and the preparation of structures with nanoscale. The urgency of the work is caused by the …

Research of influence of the underlayer material on the growth rate of carbon nanotube arrays for manufacturing non-volatile memory elements with high speed

VS Klimin, MV Il'Ina, OI Il'In, NN Rudyk… - Journal of Physics …, 2017 - iopscience.iop.org
This experimental work is devoted to the regimes of obtaining arrays of carbon nanotubes.
Arrays of perpendicular nanotubes perpendicular to the surface were obtained by the …

Detailed characterisation of focused ion beam induced lateral damage on silicon carbide samples by electrical scanning probe microscopy and transmission electron …

F Stumpf, AA Abu Quba, P Singer, M Rumler… - Journal of applied …, 2018 - pubs.aip.org
The lateral damage induced by focused ion beam on silicon carbide was characterized
using electrical scanning probe microscopy (SPM), namely, scanning spreading resistance …

Studying the resolving power of nanosized profiling using focused ion beams

OA Ageev, AM Alekseev, AV Vnukova… - Nanotechnologies in …, 2014 - Springer
The results of experimental studies of the resolving power and accuracy of nanosized
profiling using focused ion beams (FIBs) are presented. Dependences of the resolving …

Focused ion beam assisted prototyping of graphene/ZnO devices on Zn-polar and O-polar faces of ZnO bulk crystals

S Tiagulskyi, R Yatskiv, H Faitová… - Physica E: Low …, 2022 - Elsevier
We demonstrate an experimental approach for prototyping heterojunctions formed between
graphene and bulk semiconductor substrates. This approach employs focused ion beam …

Nanoscale profiling of multilayer graphene films on silicon carbide by a focused ion beam

AS Kolomiytsev, IL Jityaev, AM Svetlichnyi… - Diamond and Related …, 2020 - Elsevier
The controlled and reproducible formation of a nanoscale interelectrode gap is crucial for
the development of next-generation nanoelectronics devices, such as nano …

Influence of two-stage growth during the formation of GaAs/Si heterostructures for the creation of optoelectronic devices

AA Geldash, VN Djuplin, VS Klimin… - Journal of Physics …, 2019 - iopscience.iop.org
Abstract The development of GaAs/Si heterostructures can be an important stage for use as
solar cells, LEDs and lasers based on silicon substrates. At present, A3B5 compounds …