Flexible metal-oxide devices made by room-temperature photochemical activation of sol–gel films

YH Kim, JS Heo, TH Kim, S Park, MH Yoon, J Kim… - Nature, 2012 - nature.com
Amorphous metal-oxide semiconductors have emerged as potential replacements for
organic and silicon materials in thin-film electronics. The high carrier mobility in the …

Transparent semiconducting oxides: Materials and devices

M Grundmann, H Frenzel, A Lajn… - … status solidi (a), 2010 - Wiley Online Library
Transparent conductive oxides (TCOs) are a well‐known material class allowing Ohmic
conduction. A large free carrier concentration in the 1021 cm− 3 range and high conductivity …

Effects of ambient atmosphere on the transfer characteristics and gate-bias stress stability of amorphous indium-gallium-zinc oxide thin-film transistors

SY Sung, JH Choi, UB Han, KC Lee, JH Lee… - Applied physics …, 2010 - pubs.aip.org
We investigated the transfer characteristics and the gate-bias stability of amorphous indium-
gallium-zinc oxide thin-film transistors when the channel layer was exposed to hydrogen …

[HTML][HTML] Energy band offsets of dielectrics on InGaZnO4

DC Hays, BP Gila, SJ Pearton, F Ren - Applied Physics Reviews, 2017 - pubs.aip.org
Thin-film transistors (TFTs) with channels made of hydrogenated amorphous silicon (a-Si: H)
and polycrystalline silicon (poly-Si) are used extensively in the display industry. Amorphous …

Fabrication of p-channel thin-film transistors using CuO active layers deposited at low temperature

SY Sung, SY Kim, KM Jo, JH Lee, JJ Kim… - Applied Physics …, 2010 - pubs.aip.org
We investigated copper oxides for use as an active layer of p-channel field-effect thin-film
transistors (TFTs). Cu 2 O thin films deposited at room temperature using rf magnetron …

Low-temperature organic (CYTOP) passivation for improvement of electric characteristics and reliability in IGZO TFTs

SH Choi, JH Jang, JJ Kim… - IEEE electron device letters, 2012 - ieeexplore.ieee.org
We proposed and fabricated amorphous indium-gallium-zinc-oxide thin-film transistors
(TFTs) employing a novel organic-passivation layer (CYTOP) that results in low damage and …

Valence and conduction band offsets in AZO/Ga2O3 heterostructures

PH Carey IV, F Ren, DC Hays, BP Gila, SJ Pearton… - Vacuum, 2017 - Elsevier
We report on the determination of band offsets in rf-sputtered Aluminum Zinc Oxide
(AZO)/single crystal β-Ga 2 O 3 (AZO/Ga 2 O 3) heterostructures using X-Ray Photoelectron …

Influence of channel layer thickness on the stability of amorphous indium zinc oxide thin film transistors

Z Yang, J Yang, T Meng, M Qu, Q Zhang - Materials Letters, 2016 - Elsevier
Amorphous indium zinc oxide (a-IZO) thin film transistors (TFTs) with different channel layer
thickness were fabricated on silicon wafers by radio frequency magnetron sputtering method …

Improved stability of aluminum co-sputtered indium zinc oxide thin-film transistor

J Park, Y Lim, M Jang, S Choi, N Hwang, M Yi - Materials Research Bulletin, 2017 - Elsevier
Abstract 1 The electrical performance and bias stability of radio-frequency magnetron co-
sputtered aluminum-indium-zinc oxide (Al-IZO) thin-film transistors (TFTs) were investigated …

Measurement of SiO2/InZnGaO4 heterojunction band offsets by x-ray photoelectron spectroscopy

EA Douglas, A Scheurmann, RP Davies… - Applied Physics …, 2011 - pubs.aip.org
X-ray photoelectron spectroscopy was used to measure the energy discontinuity in the
valence band (ΔE v) of SiO 2/InZnGaO 4 (IGZO) heterostructures deposited by low …