Besides the excellent high-temperature mechanical properties, Si3N4 and SiC based
ceramics containing insulating or electrically conductive phase are attractive for their tunable …

In the materials manufacturing sector, energy efficiency, sustainability, and economic
viability have become increasingly important to industry and society in recent years …

This comprehensive study systematically investigates the influence of C 2 H 2 flow rates on
silicon carbonitride (SiCN) thin films deposited on p-type c-Si (100) substrates through …

Silicon carbonitride SiCN films have attracted considerable interest due to their outstanding
characteristics, such as dielectric, optical, mechanical properties, thermal stability, oxidation …

Hydrogenated amorphous silicon carbonitride films (a-SiCN: H) have been deposited at low
temperature by mid-frequency pulsed plasma enhanced chemical vapour deposition …

Non-fluorine-based organic–inorganic-hybrid coatings exhibiting superhydrophobic
properties were prepared using a single-step process of atmospheric rf glow discharge …

Silicon carbonitride (SiCN), an intermediate structure between silicon carbide and silicon
nitride, has emerged as a material of interest to increase the performance of silicon-based …

Structural, optoelectronic and mechanical properties of amorphous silicon carbon nitride (Si-
CN) thin films produced by plasma enhanced chemical vapor deposition (PECVD) at …

We report a novel three-step SiN x atomic layer deposition (ALD) process using Si2Cl6,
CH3NH2, and N2 plasma. In a two-step process, nonhydrogenated chlorosilanes such as …

Silicon carbonitride (SiCN) thin film has been deposited over the p-type c-Si (100) substrate
by thermal chemical vapor deposition (CVD) process in the nitrogen (N2) gas atmosphere …