Laser-produced transient tin plasmas are the sources of extreme ultraviolet (EUV) light at 13.5 nm wavelength for next-generation nanolithography, enabling the continued …
P Micke, S Kühn, L Buchauer, JR Harries… - Review of Scientific …, 2018 - pubs.aip.org
Highly charged ions (HCIs) constitute a large class of atomic systems since each element has as many ionization states as it has protons—in a sense, this extends the periodic table …
An experimental study of laser-produced plasmas is performed by irradiating a planar tin target by laser pulses, of 4.8 ns duration, produced from a KTP-based 2-µm-wavelength …
The propulsion of a liquid indium-tin microdroplet by nanosecond-pulse laser impact is experimentally investigated. We capture the physics of the droplet propulsion in a scaling …
Plasma produced from molten-tin microdroplets generates extreme ultraviolet light for state- of-the-art nanolithography. Currently, CO 2 lasers are used to drive the plasma. In the future …
We studied Extreme Ultra-Violet (EUV) emission characteristics of the 13.5 nm wavelength from CO_2 laser-irradiated pre-formed tin plasmas using 2D radiation hydrodynamic …
DK Yang, D Wang, QS Huang, Y Song, J Wu, WX Li… - Chip, 2022 - Elsevier
Extreme ultraviolet lithography (EUVL) has been demonstrated to meet the industrial requirements of new-generation semiconductor fabrication. The development of high-power …
We experimentally and numerically investigate the early-time hydrodynamic response of tin microdroplets driven by a ns-laser-induced plasma. Experimentally, we use stroboscopic …
DJ Hemminga, L Poirier, MM Basko… - Plasma Sources …, 2021 - iopscience.iop.org
We present the results of a joint experimental and theoretical study of plasma expansion arising from Nd: YAG laser ablation (laser wavelength λ= 1.064 μm) of tin microdroplets in …